US Patent Issued to ASML Netherlands on Aug. 4 for "Projection system and mirror and radiation source for a lithographic apparatus" (Dutch Inventors)

Media-aandacht

• Titel	US Patent Issued to ASML Netherlands on Aug. 4 for "Projection system and mirror and radiation source for a lithographic apparatus" (Dutch Inventors)
  Media naam/outlet	US Fed News
  Land/Regio	Verenigde Staten van Amerika
  Release datum	4/08/20
  Personen	Hans Butler