Nanosecond pulsed discharges: generation, measurement and plasma processing

Huiskamp, T. (Spreker), F.J.C.M. Beckers (Spreker), van Heesch, E. J. M. (Spreker), Hoeben, W. F. L. M. (Spreker), Pemen, A. J. M. (Spreker)

Activiteit: Types gesprekken of presentatiesGenodigd sprekerWetenschappelijk


In this contribution we report on our recent progress in generating and measuring nanosecond pulsed discharges for plasma processing applications. The nanosecond pulses are generated by a single-line pulse topology which is able to output 0.5-10-ns, positive and negative 0-50-kV pulses with a rise time of less than 200 ps at a pulse repetition rate of 1 kHz. With D-dot and B-dot sensors and spatiotemporal resolved iCCD imaging we monitor voltage and current waveforms and the development of the streamer discharge. In addition, we perform several plasma processing experiments. The results show extremely high yields in ozone generation and NO removal. A general conclusions is that the shortest rise time pulses result in the highest plasma processing yields and the highest streamer velocities.
Periode9 jul 201710 jul 2017
EvenementstitelICPIG 2017 International Conference on Phenomena in Ionized Gases: null
LocatieEstoril, Portugal
Mate van erkenningInternationaal