Thin film cavity ringdown spectroscopy (tf-CRDS)
: a direct and ultra-sensitive absorption technique for defect measurements on a-Si:H thin films

  • B. Hoex

Student thesis: Master

Abstract

Date of Award31 Aug 2003
Original languageEnglish
SupervisorI.M.P. Aarts (Supervisor 1), W.M.M. (Erwin) Kessels (Supervisor 2) & M.C.M. (Richard) van de Sanden (Supervisor 2)

Cite this

Thin film cavity ringdown spectroscopy (tf-CRDS): a direct and ultra-sensitive absorption technique for defect measurements on a-Si:H thin films
Hoex, B. (Author). 31 Aug 2003

Student thesis: Master