The use of substrate biasing during plasma-enhanced atomic layer deposition of TiN for area-selective deposition

  • S. Vlaanderen

Student thesis: Master

Abstract

Date of Award2019
Original languageEnglish
SupervisorTahsin Faraz (Supervisor 1), Marc J.M. Merkx (Supervisor 2) & Adrie J.M. Mackus (Supervisor 2)

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