Abstract
| Date of Award | 31 Dec 2002 |
|---|---|
| Original language | English |
| Supervisor | M.C.M. (Richard) van de Sanden (Supervisor 1), Johan P.M. Hoefnagels (Supervisor 2) & W.M.M. (Erwin) Kessels (Supervisor 2) |
Temperature dependence of the surface reactivity of SiH3 on plasma deposited a-Si:H : a time resolved cavity ringdown study
Student thesis: Master