Temperature dependence of the surface reactivity of SiH3 on plasma deposited a-Si:H : a time resolved cavity ringdown study

  • Y. Barrell

Student thesis: Master

Abstract

Date of Award31 Dec 2002
Original languageEnglish
SupervisorM.C.M. (Richard) van de Sanden (Supervisor 1), Johan P.M. Hoefnagels (Supervisor 2) & W.M.M. (Erwin) Kessels (Supervisor 2)

Cite this

Temperature dependence of the surface reactivity of SiH3 on plasma deposited a-Si:H : a time resolved cavity ringdown study
Barrell, Y. (Author). 31 Dec 2002

Student thesis: Master