Plasma assisted and thermal atomic layer deposition of AI2O3 in the Oxford Instruments OpAL reactor

  • L.R.J.G. van den Elzen

Student thesis: Master

Abstract

Date of Award31 Aug 2010
Original languageEnglish
SupervisorG. Dingemans (Supervisor 1) & W.M.M. (Erwin) Kessels (Supervisor 2)

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