On the influence of ICP-PECVD deposition parameters and annealing on the properties of a-Si:H passivation layers

Student thesis: Bachelor

Abstract

Date of Award2014
Original languageEnglish
SupervisorBart Macco (Supervisor 1) & W.M.M. (Erwin) Kessels (Supervisor 2)

Cite this

On the influence of ICP-PECVD deposition parameters and annealing on the properties of a-Si:H passivation layers
Arts, K. (Author). 2014

Student thesis: Bachelor