On the conformality of silicon oxide prepared by plasma atomic layer deposition

: effect of process conditions on the recombination of oxygen radicals

  • J.H. Deijkers

Student thesis: Master

Abstract

Date of Award2020
Original languageEnglish
SupervisorHarm C.M. Knoops (Supervisor 1) & Karsten Arts (Supervisor 2)

Cite this

On the conformality of silicon oxide prepared by plasma atomic layer deposition: effect of process conditions on the recombination of oxygen radicals
Deijkers, J. H. (Author). 2020

Student thesis: Master