New experimental setup for surface studies during silicon-based film growth

: radical sources and hydrogen-induced etching experiments

Student thesis: Master

Abstract

Date of Award31 Dec 2003
Original languageEnglish
SupervisorJohan P.M. Hoefnagels (Supervisor 1), W.M.M. (Erwin) Kessels (Supervisor 2) & M.C.M. (Richard) van de Sanden (Supervisor 2)

Cite this

New experimental setup for surface studies during silicon-based film growth: radical sources and hydrogen-induced etching experiments
Langereis, E. (Author). 31 Dec 2003

Student thesis: Master