Modeling the influence of defocus and the third resist dimension on feature failure in photolithography

  • Anne K.F. Bierens

Student thesis: Master

Date of Award15 Jan 2025
Original languageEnglish
SupervisorRemco W. van der Hofstad (Supervisor 1), Frank Röttger (Supervisor 2), Bram Slachter (External coach) & Tom Castenmiller (External coach)

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