Microstructural characterization of plasma-deposited SiO2-like thin films
: a detailed study by means of ellipsometric porosimetry

  • N.M. Terlinden

Student thesis: Master

Abstract

Date of Award31 Oct 2008
Original languageEnglish
SupervisorM. (Adriana) Creatore (Supervisor 1) & M.C.M. (Richard) van de Sanden (Supervisor 2)

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