| Date of Award | 31 Aug 2012 |
|---|---|
| Original language | English |
| Supervisor | W.M.J.M. Coene (Supervisor 1), J.J.M. Baselmans (External coach), Nico Vanroose (External coach) & Siep Weiland (Supervisor 2) |
Design of a model for the prediction of aberration sensitivities in nanolithography process
Student thesis: Master