Deposition and etching in inductively coupled fluorocarbon plasmas

  • T.E.F.M. Standaert

Student thesis: Master

Abstract

Date of Award31 Dec 1996
Original languageEnglish
SupervisorDaan C. Schram (Supervisor 1), M.C.M. (Richard) van de Sanden (Supervisor 2) & G.S. Oehrlein (External coach)

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