Characterization and optimization of aluminum oxide films as p-type Czochralski silicon passivation layer

  • J.C. Goverde

Student thesis: Master

Abstract

Date of Award30 Jun 2012
Original languageEnglish
SupervisorB. Vermang (Supervisor 1) & J. John (Supervisor 2)

Cite this

Characterization and optimization of aluminum oxide films as p-type Czochralski silicon passivation layer
Goverde, J. C. (Author). 30 Jun 2012

Student thesis: Master