X-ray photoelectron spectroscopy study on the chemistry involved in tin oxide film growth during chemical vapor deposition processes

G.J.A. Mannie; G. Gerritsen; H.C.L. Abbenhuis; J. Deelen, van; J.W. Niemantsverdriet; P.C. Thüne

doi:10.1116/1.4756898

X-ray photoelectron spectroscopy study on the chemistry involved in tin oxide film growth during chemical vapor deposition processes

G.J.A. Mannie, G. Gerritsen, H.C.L. Abbenhuis, J. Deelen, van, J.W. Niemantsverdriet, P.C. Thüne

Research output: Contribution to journal › Article › Academic › peer-review

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Original language	English
Article number	01A105
Pages (from-to)	1-6
Number of pages	6
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films
Volume	31
Issue number	1
DOIs	https://doi.org/10.1116/1.4756898
Publication status	Published - 2013

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Mannie, G. J. A., Gerritsen, G., Abbenhuis, H. C. L., Deelen, van, J., Niemantsverdriet, J. W., & Thüne, P. C. (2013). X-ray photoelectron spectroscopy study on the chemistry involved in tin oxide film growth during chemical vapor deposition processes. Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films, 31(1), 1-6. [01A105]. https://doi.org/10.1116/1.4756898

@article{326c296cc2cb4488a4327085eeb56848,

title = "X-ray photoelectron spectroscopy study on the chemistry involved in tin oxide film growth during chemical vapor deposition processes",

author = "G.J.A. Mannie and G. Gerritsen and H.C.L. Abbenhuis and {Deelen, van}, J. and J.W. Niemantsverdriet and P.C. Th{\"u}ne",

year = "2013",

doi = "10.1116/1.4756898",

language = "English",

volume = "31",

pages = "1--6",

journal = "Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films",

issn = "0734-2101",

publisher = "AVS Science and Technology Society",

number = "1",

}

Mannie, GJA, Gerritsen, G , Abbenhuis, HCL, Deelen, van, J, Niemantsverdriet, JW & Thüne, PC 2013, 'X-ray photoelectron spectroscopy study on the chemistry involved in tin oxide film growth during chemical vapor deposition processes', Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films, vol. 31, no. 1, 01A105, pp. 1-6. https://doi.org/10.1116/1.4756898

X-ray photoelectron spectroscopy study on the chemistry involved in tin oxide film growth during chemical vapor deposition processes. / Mannie, G.J.A.; Gerritsen, G.; Abbenhuis, H.C.L.; Deelen, van, J.; Niemantsverdriet, J.W.; Thüne, P.C.

In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films, Vol. 31, No. 1, 01A105, 2013, p. 1-6.

Research output: Contribution to journal › Article › Academic › peer-review

TY - JOUR

T1 - X-ray photoelectron spectroscopy study on the chemistry involved in tin oxide film growth during chemical vapor deposition processes

AU - Mannie, G.J.A.

AU - Gerritsen, G.

AU - Abbenhuis, H.C.L.

AU - Deelen, van, J.

AU - Niemantsverdriet, J.W.

AU - Thüne, P.C.

PY - 2013

Y1 - 2013

U2 - 10.1116/1.4756898

DO - 10.1116/1.4756898

M3 - Article

VL - 31

SP - 1

EP - 6

JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films

JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films

SN - 0734-2101

IS - 1

M1 - 01A105

ER -