X-ray em simulation tool for ptychography dataset construction

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Abstract

In this paper, we present an electromagnetic full-wave modeling framework, as a support EM tool providing data sets for X-ray ptychographic imaging. Modeling the entire scattering problem with Finite Element Method (FEM) tools is, in fact, a prohibitive task, because of the large area illuminated by the beam (due to the poor focusing power at these wavelengths) and the very small features to be imaged. To overcome this problem, the spectrum of the illumination beam is decomposed into a discrete set of plane waves. This allows reducing the electromagnetic modeling volume to the one enclosing the area to be imaged. The total scattered field is reconstructed by superimposing the solutions for each plane wave illumination.

Original languageEnglish
Title of host publicationMetrology, Inspection, and Process Control for Microlithography XXXII
Place of PublicationSan Jose, California
PublisherSPIE
Number of pages6
ISBN (Electronic)9781510616622
DOIs
Publication statusPublished - 1 Jan 2018
EventMetrology, Inspection, and Process Control for Microlithography XXXII - San Jose, United States
Duration: 26 Feb 20181 Mar 2018

Publication series

NameProceedings of SPIE
Volume10585

Conference

ConferenceMetrology, Inspection, and Process Control for Microlithography XXXII
CountryUnited States
CitySan Jose
Period26/02/181/03/18

Keywords

  • Framework
  • Full-Wave Simulation
  • Ptychography
  • X-Ray

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