Woofer-tweeter adaptive optics for EUV lithography

M. Habets, R.W.H. Merks, S. Weiland, W. Coene

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Abstract

In this work, we present an integrated opto-thermo-mechanical modeling approach for thermal aberration prediction and control in extreme ultraviolet lithography. The thermally induced wavefront aberrations are mitigated by means of a wavefront correction strategy, based on two compensators.
Original languageEnglish
Title of host publication34th Benelux Meeting on Systems and Control
Subtitle of host publicationBook of Abstracts
Place of PublicationLeuven
PublisherKatholieke Universiteit Leuven
Pages117
Number of pages1
ISBN (Print)978-9-0738-0292-6
Publication statusPublished - 2015
Event34th Benelux Meeting on Systems and Control, March 24-26, 2015, Lommel, Belgium - Center Parcs "De Vossemeren", Lommel, Belgium
Duration: 24 Mar 201526 Mar 2015
http://www.beneluxmeeting.nl/2015/

Conference

Conference34th Benelux Meeting on Systems and Control, March 24-26, 2015, Lommel, Belgium
CountryBelgium
CityLommel
Period24/03/1526/03/15
Internet address

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