Abstract
In this work, we present an integrated opto-thermo-mechanical modeling approach for thermal aberration prediction and control in extreme ultraviolet lithography. The thermally induced wavefront aberrations are mitigated by means of a wavefront correction strategy, based on two compensators.
| Original language | English |
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| Title of host publication | 34th Benelux Meeting on Systems and Control |
| Subtitle of host publication | Book of Abstracts |
| Place of Publication | Leuven |
| Publisher | Katholieke Universiteit Leuven |
| Pages | 117 |
| Number of pages | 1 |
| ISBN (Print) | 978-9-0738-0292-6 |
| Publication status | Published - 2015 |
| Event | 34th Benelux Meeting on Systems and Control, March 24-26, 2015, Lommel, Belgium - Center Parcs "De Vossemeren", Lommel, Belgium Duration: 24 Mar 2015 → 26 Mar 2015 http://www.beneluxmeeting.nl/2015/ |
Conference
| Conference | 34th Benelux Meeting on Systems and Control, March 24-26, 2015, Lommel, Belgium |
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| Country/Territory | Belgium |
| City | Lommel |
| Period | 24/03/15 → 26/03/15 |
| Internet address |