Wavelength tuning of single and vertically stacked InAs quantum dot [QD] layers embedded inInGaAsP/InP  grown by metal organic vapor-phase epitaxy is achieved by controlling theAs/P surface exchange reaction during InAs deposition. The As/P exchange reaction is suppressedfor decreased QD growth temperature and group V-III flow ratio, reducing the QD size andphotoluminescence [PL]emission wavelength. The As/P exchange reaction and QD PL wavelengthare then reproducibly controlled by the thickness of an ultrathin [0¿2 ML] GaAs interlayerunderneath the QDs. Submonolayer GaAs coverages result in a shape transition from QDs toquantum dashes at low group V-III flow ratio. Temperature dependent PL measurements revealexcellent optical properties of the QDs up to room temperature with PL peak wavelengths in thetechnologically important 1.55 ¿region for telecom applications. Widely stacked QD layers arereproduced with identical PL emission to increase the active volume, while closely stacked QDlayers reveal a systematic PL redshift and linewidth reduction due to vertical electronic couplingwhich is proven by the linear polarization of the cleaved-side PL changing from in plane toisotropic. ¿ 2006 American Vacuum Society.