Void dynamics in low-pressure acetylene RF plasmas

F.M.J.H. Wetering, van de, S. Nijdam, J. Beckers, G.M.W. Kroesen

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

Abstract

Low-pressure acetylene plasmas are able to spontaneously form (under certain conditions) dust particles, resulting in a cloud of particulates up to micrometer sizes levitated in the plasma. We studied a capacitively coupled RF plasma with constant flow of argon and acetylene. After the dust cloud has been formed, an ellipsoid-shaped dust-free zone (void) develops. Concurrently, the dust particles grow in size. During its expansions the void suddenly stops growing and even shrinks, to shortly thereafter resume its expansion. We dubbed this the ‘hiccup’. We infer this is induced by coagulation of a new batch of dust particles inside the void. The processes are periodical and reproducible. Several techniques that are time resolved (microwave cavity resonance spectroscopy, plasma impedance monitoring) and in addition spatially resolved (Mie scattering, emission spectroscopy) are used to characterize the plasma and/or dust particles.
Original languageEnglish
Title of host publicationDutch Physics Conference, Physics@FOM, 21-22 January 2014, Veldhoven, The Netherlands
Pages39-39
Publication statusPublished - 2014

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acetylene
voids
low pressure
dust
expansion
Mie scattering
coagulation
ellipsoids
spectroscopy
particulates
micrometers
argon
impedance
microwaves
cavities

Cite this

Wetering, van de, F. M. J. H., Nijdam, S., Beckers, J., & Kroesen, G. M. W. (2014). Void dynamics in low-pressure acetylene RF plasmas. In Dutch Physics Conference, Physics@FOM, 21-22 January 2014, Veldhoven, The Netherlands (pp. 39-39)
Wetering, van de, F.M.J.H. ; Nijdam, S. ; Beckers, J. ; Kroesen, G.M.W. / Void dynamics in low-pressure acetylene RF plasmas. Dutch Physics Conference, Physics@FOM, 21-22 January 2014, Veldhoven, The Netherlands. 2014. pp. 39-39
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Wetering, van de, FMJH, Nijdam, S, Beckers, J & Kroesen, GMW 2014, Void dynamics in low-pressure acetylene RF plasmas. in Dutch Physics Conference, Physics@FOM, 21-22 January 2014, Veldhoven, The Netherlands. pp. 39-39.

Void dynamics in low-pressure acetylene RF plasmas. / Wetering, van de, F.M.J.H.; Nijdam, S.; Beckers, J.; Kroesen, G.M.W.

Dutch Physics Conference, Physics@FOM, 21-22 January 2014, Veldhoven, The Netherlands. 2014. p. 39-39.

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

TY - GEN

T1 - Void dynamics in low-pressure acetylene RF plasmas

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AU - Beckers, J.

AU - Kroesen, G.M.W.

PY - 2014

Y1 - 2014

N2 - Low-pressure acetylene plasmas are able to spontaneously form (under certain conditions) dust particles, resulting in a cloud of particulates up to micrometer sizes levitated in the plasma. We studied a capacitively coupled RF plasma with constant flow of argon and acetylene. After the dust cloud has been formed, an ellipsoid-shaped dust-free zone (void) develops. Concurrently, the dust particles grow in size. During its expansions the void suddenly stops growing and even shrinks, to shortly thereafter resume its expansion. We dubbed this the ‘hiccup’. We infer this is induced by coagulation of a new batch of dust particles inside the void. The processes are periodical and reproducible. Several techniques that are time resolved (microwave cavity resonance spectroscopy, plasma impedance monitoring) and in addition spatially resolved (Mie scattering, emission spectroscopy) are used to characterize the plasma and/or dust particles.

AB - Low-pressure acetylene plasmas are able to spontaneously form (under certain conditions) dust particles, resulting in a cloud of particulates up to micrometer sizes levitated in the plasma. We studied a capacitively coupled RF plasma with constant flow of argon and acetylene. After the dust cloud has been formed, an ellipsoid-shaped dust-free zone (void) develops. Concurrently, the dust particles grow in size. During its expansions the void suddenly stops growing and even shrinks, to shortly thereafter resume its expansion. We dubbed this the ‘hiccup’. We infer this is induced by coagulation of a new batch of dust particles inside the void. The processes are periodical and reproducible. Several techniques that are time resolved (microwave cavity resonance spectroscopy, plasma impedance monitoring) and in addition spatially resolved (Mie scattering, emission spectroscopy) are used to characterize the plasma and/or dust particles.

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Wetering, van de FMJH, Nijdam S, Beckers J, Kroesen GMW. Void dynamics in low-pressure acetylene RF plasmas. In Dutch Physics Conference, Physics@FOM, 21-22 January 2014, Veldhoven, The Netherlands. 2014. p. 39-39