Void dynamics in low-pressure acetylene RF plasmas

F.M.J.H. Wetering, van de, R.J.C. Brooimans, S. Nijdam, J. Beckers, G. Kroesen

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

Abstract

Low-pressure acetylene plasmas are able to spontaneously form (under certain conditions) dust particles, resulting in a cloud of particulates up to micrometer sizes levitated in the plasma. We studied a capacitively coupled RF plasma with constant flow of argon and acetylene. After the dust cloud has been formed, an ellipsoid-shaped dust-free zone (void) develops. Concurrently, the dust particles grow in size. During its expansions the void suddenly stops growing and even shrinks, to shortly thereafter resume its expansion. We dubbed this the ‘hiccup’. We infer this is induced by coagulation of a new batch of dust particles inside the void. The processes are periodical and reproducible. Several techniques that are time resolved (microwave cavity resonance spectroscopy, plasma impedance monitoring) and in addition spatially resolved (Mie scattering, emission spectroscopy) are used to characterize the plasma and/or dust particles.
Original languageEnglish
Title of host publicationProceedings of the 16th Workshop on the Exploration of Low Temperature Plasma Physics (WELTPP-16), 21-22 November 2013, Kerkrade, The Netherlands
Pages10-10
Publication statusPublished - 2013
Event16th Euregional Workshop on the Exploration of Low Temperature Plasma Physics (WELTPP 2013) - Conference centre "Rolduc", Kerkrade, Netherlands
Duration: 21 Nov 201322 Nov 2013
https://www.tue.nl/fileadmin/content/faculteiten/tn/PMP/Research/Conferences___Workshops/WELTPP_16/announcement_2013.pdf

Workshop

Workshop16th Euregional Workshop on the Exploration of Low Temperature Plasma Physics (WELTPP 2013)
Abbreviated titleWELTPP-16
CountryNetherlands
CityKerkrade
Period21/11/1322/11/13
Internet address

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acetylene
voids
low pressure
dust
expansion
Mie scattering
coagulation
ellipsoids
spectroscopy
particulates
micrometers
argon
impedance
microwaves
cavities

Cite this

Wetering, van de, F. M. J. H., Brooimans, R. J. C., Nijdam, S., Beckers, J., & Kroesen, G. (2013). Void dynamics in low-pressure acetylene RF plasmas. In Proceedings of the 16th Workshop on the Exploration of Low Temperature Plasma Physics (WELTPP-16), 21-22 November 2013, Kerkrade, The Netherlands (pp. 10-10)
Wetering, van de, F.M.J.H. ; Brooimans, R.J.C. ; Nijdam, S. ; Beckers, J. ; Kroesen, G. / Void dynamics in low-pressure acetylene RF plasmas. Proceedings of the 16th Workshop on the Exploration of Low Temperature Plasma Physics (WELTPP-16), 21-22 November 2013, Kerkrade, The Netherlands. 2013. pp. 10-10
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abstract = "Low-pressure acetylene plasmas are able to spontaneously form (under certain conditions) dust particles, resulting in a cloud of particulates up to micrometer sizes levitated in the plasma. We studied a capacitively coupled RF plasma with constant flow of argon and acetylene. After the dust cloud has been formed, an ellipsoid-shaped dust-free zone (void) develops. Concurrently, the dust particles grow in size. During its expansions the void suddenly stops growing and even shrinks, to shortly thereafter resume its expansion. We dubbed this the ‘hiccup’. We infer this is induced by coagulation of a new batch of dust particles inside the void. The processes are periodical and reproducible. Several techniques that are time resolved (microwave cavity resonance spectroscopy, plasma impedance monitoring) and in addition spatially resolved (Mie scattering, emission spectroscopy) are used to characterize the plasma and/or dust particles.",
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year = "2013",
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Wetering, van de, FMJH, Brooimans, RJC, Nijdam, S, Beckers, J & Kroesen, G 2013, Void dynamics in low-pressure acetylene RF plasmas. in Proceedings of the 16th Workshop on the Exploration of Low Temperature Plasma Physics (WELTPP-16), 21-22 November 2013, Kerkrade, The Netherlands. pp. 10-10, 16th Euregional Workshop on the Exploration of Low Temperature Plasma Physics (WELTPP 2013), Kerkrade, Netherlands, 21/11/13.

Void dynamics in low-pressure acetylene RF plasmas. / Wetering, van de, F.M.J.H.; Brooimans, R.J.C.; Nijdam, S.; Beckers, J.; Kroesen, G.

Proceedings of the 16th Workshop on the Exploration of Low Temperature Plasma Physics (WELTPP-16), 21-22 November 2013, Kerkrade, The Netherlands. 2013. p. 10-10.

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

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AU - Wetering, van de, F.M.J.H.

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AU - Kroesen, G.

PY - 2013

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N2 - Low-pressure acetylene plasmas are able to spontaneously form (under certain conditions) dust particles, resulting in a cloud of particulates up to micrometer sizes levitated in the plasma. We studied a capacitively coupled RF plasma with constant flow of argon and acetylene. After the dust cloud has been formed, an ellipsoid-shaped dust-free zone (void) develops. Concurrently, the dust particles grow in size. During its expansions the void suddenly stops growing and even shrinks, to shortly thereafter resume its expansion. We dubbed this the ‘hiccup’. We infer this is induced by coagulation of a new batch of dust particles inside the void. The processes are periodical and reproducible. Several techniques that are time resolved (microwave cavity resonance spectroscopy, plasma impedance monitoring) and in addition spatially resolved (Mie scattering, emission spectroscopy) are used to characterize the plasma and/or dust particles.

AB - Low-pressure acetylene plasmas are able to spontaneously form (under certain conditions) dust particles, resulting in a cloud of particulates up to micrometer sizes levitated in the plasma. We studied a capacitively coupled RF plasma with constant flow of argon and acetylene. After the dust cloud has been formed, an ellipsoid-shaped dust-free zone (void) develops. Concurrently, the dust particles grow in size. During its expansions the void suddenly stops growing and even shrinks, to shortly thereafter resume its expansion. We dubbed this the ‘hiccup’. We infer this is induced by coagulation of a new batch of dust particles inside the void. The processes are periodical and reproducible. Several techniques that are time resolved (microwave cavity resonance spectroscopy, plasma impedance monitoring) and in addition spatially resolved (Mie scattering, emission spectroscopy) are used to characterize the plasma and/or dust particles.

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Wetering, van de FMJH, Brooimans RJC, Nijdam S, Beckers J, Kroesen G. Void dynamics in low-pressure acetylene RF plasmas. In Proceedings of the 16th Workshop on the Exploration of Low Temperature Plasma Physics (WELTPP-16), 21-22 November 2013, Kerkrade, The Netherlands. 2013. p. 10-10