Vertical and smooth single-step reactive ion etching process for InP membrane waveguides

Y. Jiao, T. Vries, de, R.-S. Unger, L. Shen, H.P.M.M. Ambrosius, C. Radu, M. Arens, M.K. Smit, J.J.G.M. Tol, van der

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Abstract

In this paper we present a novel single-step RIE process for InP membrane optical waveguide etching. The optimization of the process is focused on the sidewall verticality and surface roughness of the etched profile. Significant improvement on the etched profile is achieved for the first time in a single-step RIE process. Loss measurement on fabricated membrane waveguides etched with the proposed RIE process results in a record low waveguide propagation loss (2.5 dB/cm).
Original languageEnglish
Pages (from-to)E90-E95
JournalJournal of the Electrochemical Society
Volume162
Issue number8
DOIs
Publication statusPublished - 2015

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