Vapor pressures of precursors for the CVD of silicon-based films

Gregory R. Alcott; Richard M.C.M. van de Sanden; Sascha Kondic; Joannes L. Linden

doi:10.1002/cvde.200306145

Vapor pressures of precursors for the CVD of silicon-based films

Gregory R. Alcott
, Richard M.C.M. van de Sanden
, Sascha Kondic
, Joannes L. Linden

Plasma & Materials Processing

Research output: Contribution to journal › Article › Academic › peer-review

8 Citations (Scopus)

Abstract

The controlled vaporization and subsequent transport of liquid and solid precursors is an essential part of gas phase process technology. To accurately control precursor feed rate when using conventional bubbler systems, it is imperative to know the precursor vapor pressure, thermal stability, and purity. This paper reports further measurements performed using a procedure and system developed in-house designed to quantify vapor pressure, stability, and the presence of volatile contaminants.

Original language	English
Pages (from-to)	20-22
Number of pages	3
Journal	Chemical Vapor Deposition
Volume	10
Issue number	1
DOIs	https://doi.org/10.1002/cvde.200306145
Publication status	Published - 1 Jan 2004

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10.1002/cvde.200306145

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abstract = "The controlled vaporization and subsequent transport of liquid and solid precursors is an essential part of gas phase process technology. To accurately control precursor feed rate when using conventional bubbler systems, it is imperative to know the precursor vapor pressure, thermal stability, and purity. This paper reports further measurements performed using a procedure and system developed in-house designed to quantify vapor pressure, stability, and the presence of volatile contaminants.",

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AU - van de Sanden, Richard M.C.M.

AU - Kondic, Sascha

AU - Linden, Joannes L.

PY - 2004/1/1

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N2 - The controlled vaporization and subsequent transport of liquid and solid precursors is an essential part of gas phase process technology. To accurately control precursor feed rate when using conventional bubbler systems, it is imperative to know the precursor vapor pressure, thermal stability, and purity. This paper reports further measurements performed using a procedure and system developed in-house designed to quantify vapor pressure, stability, and the presence of volatile contaminants.

AB - The controlled vaporization and subsequent transport of liquid and solid precursors is an essential part of gas phase process technology. To accurately control precursor feed rate when using conventional bubbler systems, it is imperative to know the precursor vapor pressure, thermal stability, and purity. This paper reports further measurements performed using a procedure and system developed in-house designed to quantify vapor pressure, stability, and the presence of volatile contaminants.

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Vapor pressures of precursors for the CVD of silicon-based films

Abstract

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