Uniform planarization technique for the realization of a twin-guide membrane laser

S.P. Bhat; L. Fernandez; J.J.G.M. Tol, van der; G. Roelkens; H.P.M.M. Ambrosius; M.K. Smit

Uniform planarization technique for the realization of a twin-guide membrane laser

S.P. Bhat
, L. Fernandez
, J.J.G.M. Tol, van der
, G. Roelkens
, H.P.M.M. Ambrosius
, M.K. Smit

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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Abstract

The InP Membrane on Silicon (IMOS) generic technology promises high index contrast photonic integrated circuits. To make this a reality fabrication of an electrically pumped twin-guide laser is pursued. In this paper, one of the bottle-necks for the processing is discussed, the planarization step and subsequent etch-back. Benzocyclobutene (BCB) is used to planarize SOA structures before contacting. Complete curing of BCB at 280oC creates uniformity issues during etch-back. To mitigate this, a partial cure at 180oC before the etch-back and a complete cure afterwards is performed. Experiments show repeatability and reproducibility. Good uniformity after etch-back is found.

Original language	English
Title of host publication	Proceedings of the 18th annual symposium of the IEEE Photonics Society Benelux Chapter, November 25-26, 2013, Eindhoven, The Netherlands
Editors	X.J.M. Leijtens, D. Pustakhod
Place of Publication	Eindhoven
Publisher	Technische Universiteit Eindhoven
Pages	219-222
ISBN (Print)	978-90-386-3512-5
Publication status	Published - 2013
Event	18th Annual Symposium of the IEEE Photonics Benelux Chapter - Eindhoven, Netherlands Duration: 25 Nov 2013 → 26 Nov 2013 http://www.photonics-benelux.org/symp13/

Conference

Conference	18th Annual Symposium of the IEEE Photonics Benelux Chapter
Country/Territory	Netherlands
City	Eindhoven
Period	25/11/13 → 26/11/13
Internet address	http://www.photonics-benelux.org/symp13/

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Bhat, S. P., Fernandez, L., Tol, van der, J. J. G. M., Roelkens, G., Ambrosius, H. P. M. M., & Smit, M. K. (2013). Uniform planarization technique for the realization of a twin-guide membrane laser. In X. J. M. Leijtens, & D. Pustakhod (Eds.), Proceedings of the 18th annual symposium of the IEEE Photonics Society Benelux Chapter, November 25-26, 2013, Eindhoven, The Netherlands (pp. 219-222). Technische Universiteit Eindhoven.

Bhat, S.P. ; Fernandez, L. ; Tol, van der, J.J.G.M. et al. / Uniform planarization technique for the realization of a twin-guide membrane laser. Proceedings of the 18th annual symposium of the IEEE Photonics Society Benelux Chapter, November 25-26, 2013, Eindhoven, The Netherlands. editor / X.J.M. Leijtens ; D. Pustakhod. Eindhoven : Technische Universiteit Eindhoven, 2013. pp. 219-222

@inproceedings{a208f8c53f5c4a73a9c3bfad7729b3e6,

title = "Uniform planarization technique for the realization of a twin-guide membrane laser",

abstract = "The InP Membrane on Silicon (IMOS) generic technology promises high index contrast photonic integrated circuits. To make this a reality fabrication of an electrically pumped twin-guide laser is pursued. In this paper, one of the bottle-necks for the processing is discussed, the planarization step and subsequent etch-back. Benzocyclobutene (BCB) is used to planarize SOA structures before contacting. Complete curing of BCB at 280oC creates uniformity issues during etch-back. To mitigate this, a partial cure at 180oC before the etch-back and a complete cure afterwards is performed. Experiments show repeatability and reproducibility. Good uniformity after etch-back is found.",

author = "S.P. Bhat and L. Fernandez and \{Tol, van der\}, J.J.G.M. and G. Roelkens and H.P.M.M. Ambrosius and M.K. Smit",

year = "2013",

language = "English",

isbn = "978-90-386-3512-5",

pages = "219--222",

editor = "X.J.M. Leijtens and D. Pustakhod",

booktitle = "Proceedings of the 18th annual symposium of the IEEE Photonics Society Benelux Chapter, November 25-26, 2013, Eindhoven, The Netherlands",

publisher = "Technische Universiteit Eindhoven",

note = "18th Annual Symposium of the IEEE Photonics Benelux Chapter ; Conference date: 25-11-2013 Through 26-11-2013",

url = "http://www.photonics-benelux.org/symp13/",

}

Bhat, SP, Fernandez, L, Tol, van der, JJGM, Roelkens, G, Ambrosius, HPMM & Smit, MK 2013, Uniform planarization technique for the realization of a twin-guide membrane laser. in XJM Leijtens & D Pustakhod (eds), Proceedings of the 18th annual symposium of the IEEE Photonics Society Benelux Chapter, November 25-26, 2013, Eindhoven, The Netherlands. Technische Universiteit Eindhoven, Eindhoven, pp. 219-222, 18th Annual Symposium of the IEEE Photonics Benelux Chapter, Eindhoven, Netherlands, 25/11/13.

Uniform planarization technique for the realization of a twin-guide membrane laser. / Bhat, S.P.; Fernandez, L.; Tol, van der, J.J.G.M. et al.
Proceedings of the 18th annual symposium of the IEEE Photonics Society Benelux Chapter, November 25-26, 2013, Eindhoven, The Netherlands. ed. / X.J.M. Leijtens; D. Pustakhod. Eindhoven: Technische Universiteit Eindhoven, 2013. p. 219-222.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Uniform planarization technique for the realization of a twin-guide membrane laser

AU - Bhat, S.P.

AU - Fernandez, L.

AU - Tol, van der, J.J.G.M.

AU - Roelkens, G.

AU - Ambrosius, H.P.M.M.

AU - Smit, M.K.

PY - 2013

Y1 - 2013

N2 - The InP Membrane on Silicon (IMOS) generic technology promises high index contrast photonic integrated circuits. To make this a reality fabrication of an electrically pumped twin-guide laser is pursued. In this paper, one of the bottle-necks for the processing is discussed, the planarization step and subsequent etch-back. Benzocyclobutene (BCB) is used to planarize SOA structures before contacting. Complete curing of BCB at 280oC creates uniformity issues during etch-back. To mitigate this, a partial cure at 180oC before the etch-back and a complete cure afterwards is performed. Experiments show repeatability and reproducibility. Good uniformity after etch-back is found.

AB - The InP Membrane on Silicon (IMOS) generic technology promises high index contrast photonic integrated circuits. To make this a reality fabrication of an electrically pumped twin-guide laser is pursued. In this paper, one of the bottle-necks for the processing is discussed, the planarization step and subsequent etch-back. Benzocyclobutene (BCB) is used to planarize SOA structures before contacting. Complete curing of BCB at 280oC creates uniformity issues during etch-back. To mitigate this, a partial cure at 180oC before the etch-back and a complete cure afterwards is performed. Experiments show repeatability and reproducibility. Good uniformity after etch-back is found.

M3 - Conference contribution

SN - 978-90-386-3512-5

SP - 219

EP - 222

BT - Proceedings of the 18th annual symposium of the IEEE Photonics Society Benelux Chapter, November 25-26, 2013, Eindhoven, The Netherlands

A2 - Leijtens, X.J.M.

A2 - Pustakhod, D.

PB - Technische Universiteit Eindhoven

CY - Eindhoven

T2 - 18th Annual Symposium of the IEEE Photonics Benelux Chapter

Y2 - 25 November 2013 through 26 November 2013

ER -

Bhat SP, Fernandez L, Tol, van der JJGM, Roelkens G, Ambrosius HPMM , Smit MK. Uniform planarization technique for the realization of a twin-guide membrane laser. In Leijtens XJM, Pustakhod D, editors, Proceedings of the 18th annual symposium of the IEEE Photonics Society Benelux Chapter, November 25-26, 2013, Eindhoven, The Netherlands. Eindhoven: Technische Universiteit Eindhoven. 2013. p. 219-222

Uniform planarization technique for the realization of a twin-guide membrane laser

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