Uniform planarization technique for the realization of a twin-guide membrane laser

S.P. Bhat, L. Fernandez, J.J.G.M. Tol, van der, G. Roelkens, H.P.M.M. Ambrosius, M.K. Smit

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Abstract

The InP Membrane on Silicon (IMOS) generic technology promises high index contrast photonic integrated circuits. To make this a reality fabrication of an electrically pumped twin-guide laser is pursued. In this paper, one of the bottle-necks for the processing is discussed, the planarization step and subsequent etch-back. Benzocyclobutene (BCB) is used to planarize SOA structures before contacting. Complete curing of BCB at 280oC creates uniformity issues during etch-back. To mitigate this, a partial cure at 180oC before the etch-back and a complete cure afterwards is performed. Experiments show repeatability and reproducibility. Good uniformity after etch-back is found.
Original languageEnglish
Title of host publicationProceedings of the 18th annual symposium of the IEEE Photonics Society Benelux Chapter, November 25-26, 2013, Eindhoven, The Netherlands
EditorsX.J.M. Leijtens, D. Pustakhod
Place of PublicationEindhoven
PublisherTechnische Universiteit Eindhoven
Pages219-222
ISBN (Print)978-90-386-3512-5
Publication statusPublished - 2013
Event18th Annual Symposium of the IEEE Photonics Benelux Chapter - Eindhoven, Netherlands
Duration: 25 Nov 201326 Nov 2013
http://www.photonics-benelux.org/symp13/

Conference

Conference18th Annual Symposium of the IEEE Photonics Benelux Chapter
CountryNetherlands
CityEindhoven
Period25/11/1326/11/13
Internet address

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