Uniform large-area slot-die coating of soluble metal oxide semiconductor towards mass production of high-performance TFT backplanes

Ilias Katsouras; Joris Maas; Jan Laurens van der Steen; Gerwin Gelinck; Ryo Takata; Marko Marinkovic; Anita Neumann; Duy Vu Pham; Ralf Anselmann; Tung Huei Ke; Steve Smout; Sarah Schols

Uniform large-area slot-die coating of soluble metal oxide semiconductor towards mass production of high-performance TFT backplanes

Ilias Katsouras
, Joris Maas
, Jan Laurens van der Steen
, Gerwin Gelinck
, Ryo Takata
, Marko Marinkovic
, Anita Neumann
, Duy Vu Pham
, Ralf Anselmann
, Tung Huei Ke
, Steve Smout
, Sarah Schols

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Abstract

ESL TFT backplane with solution type metal oxide semiconductor was completely processed on mass-production ready equipment. High mobility TFTs with excellent uniformity were obtained over the complete Gen1 glass substrate (320 mm × 352 mm), with good TFT bias stress reliability. An 85 ppi QVGA AMOLED display is demonstrated.

Original language	English
Title of host publication	23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016
Publisher	Society for Information Display
Pages	81-84
Number of pages	4
Volume	1
ISBN (Electronic)	9781510845510
Publication status	Published - 1 Jan 2016
Event	23rd International Display Workshops in conjunction with Asia Display (IDW 2016) - Fukuoka, Japan Duration: 7 Dec 2016 → 9 Dec 2016 Conference number: 23

Conference

Conference	23rd International Display Workshops in conjunction with Asia Display (IDW 2016)
Abbreviated title	IDW 2016
Country/Territory	Japan
City	Fukuoka
Period	7/12/16 → 9/12/16

Keywords

AMOLED display
Mass production
Metal oxide semiconductor
Slot-die coating
Solution processable

Cite this

Katsouras, I., Maas, J., van der Steen, J. L., Gelinck, G., Takata, R., Marinkovic, M., Neumann, A., Pham, D. V., Anselmann, R., Ke, T. H., Smout, S., & Schols, S. (2016). Uniform large-area slot-die coating of soluble metal oxide semiconductor towards mass production of high-performance TFT backplanes. In 23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016 (Vol. 1, pp. 81-84). Society for Information Display.

@inproceedings{6453adbda8624816a0c3e525973b9f91,

title = "Uniform large-area slot-die coating of soluble metal oxide semiconductor towards mass production of high-performance TFT backplanes",

abstract = "ESL TFT backplane with solution type metal oxide semiconductor was completely processed on mass-production ready equipment. High mobility TFTs with excellent uniformity were obtained over the complete Gen1 glass substrate (320 mm × 352 mm), with good TFT bias stress reliability. An 85 ppi QVGA AMOLED display is demonstrated.",

keywords = "AMOLED display, Mass production, Metal oxide semiconductor, Slot-die coating, Solution processable",

author = "Ilias Katsouras and Joris Maas and \{van der Steen\}, \{Jan Laurens\} and Gerwin Gelinck and Ryo Takata and Marko Marinkovic and Anita Neumann and Pham, \{Duy Vu\} and Ralf Anselmann and Ke, \{Tung Huei\} and Steve Smout and Sarah Schols",

year = "2016",

month = jan,

day = "1",

language = "English",

volume = "1",

pages = "81--84",

booktitle = "23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016",

publisher = "Society for Information Display",

address = "United States",

note = "23rd International Display Workshops in conjunction with Asia Display (IDW 2016), IDW 2016 ; Conference date: 07-12-2016 Through 09-12-2016",

}

Katsouras, I, Maas, J, van der Steen, JL, Gelinck, G, Takata, R, Marinkovic, M, Neumann, A, Pham, DV, Anselmann, R, Ke, TH, Smout, S & Schols, S 2016, Uniform large-area slot-die coating of soluble metal oxide semiconductor towards mass production of high-performance TFT backplanes. in 23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016. vol. 1, Society for Information Display, pp. 81-84, 23rd International Display Workshops in conjunction with Asia Display (IDW 2016), Fukuoka, Japan, 7/12/16.

Uniform large-area slot-die coating of soluble metal oxide semiconductor towards mass production of high-performance TFT backplanes. / Katsouras, Ilias; Maas, Joris; van der Steen, Jan Laurens et al.
23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016. Vol. 1 Society for Information Display, 2016. p. 81-84.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Uniform large-area slot-die coating of soluble metal oxide semiconductor towards mass production of high-performance TFT backplanes

AU - Katsouras, Ilias

AU - Maas, Joris

AU - van der Steen, Jan Laurens

AU - Gelinck, Gerwin

AU - Takata, Ryo

AU - Marinkovic, Marko

AU - Neumann, Anita

AU - Pham, Duy Vu

AU - Anselmann, Ralf

AU - Ke, Tung Huei

AU - Smout, Steve

AU - Schols, Sarah

N1 - Conference code: 23

PY - 2016/1/1

Y1 - 2016/1/1

N2 - ESL TFT backplane with solution type metal oxide semiconductor was completely processed on mass-production ready equipment. High mobility TFTs with excellent uniformity were obtained over the complete Gen1 glass substrate (320 mm × 352 mm), with good TFT bias stress reliability. An 85 ppi QVGA AMOLED display is demonstrated.

AB - ESL TFT backplane with solution type metal oxide semiconductor was completely processed on mass-production ready equipment. High mobility TFTs with excellent uniformity were obtained over the complete Gen1 glass substrate (320 mm × 352 mm), with good TFT bias stress reliability. An 85 ppi QVGA AMOLED display is demonstrated.

KW - AMOLED display

KW - Mass production

KW - Metal oxide semiconductor

KW - Slot-die coating

KW - Solution processable

UR - https://www.scopus.com/pages/publications/85050584312

M3 - Conference contribution

AN - SCOPUS:85050584312

VL - 1

SP - 81

EP - 84

BT - 23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016

PB - Society for Information Display

T2 - 23rd International Display Workshops in conjunction with Asia Display (IDW 2016)

Y2 - 7 December 2016 through 9 December 2016

ER -

Uniform large-area slot-die coating of soluble metal oxide semiconductor towards mass production of high-performance TFT backplanes

Abstract

Conference

Keywords

Other files and links

Fingerprint

Cite this