Abstract
ESL TFT backplane with solution type metal oxide semiconductor was completely processed on mass-production ready equipment. High mobility TFTs with excellent uniformity were obtained over the complete Gen1 glass substrate (320 mm × 352 mm), with good TFT bias stress reliability. An 85 ppi QVGA AMOLED display is demonstrated.
Original language | English |
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Title of host publication | 23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016 |
Publisher | Society for Information Display |
Pages | 81-84 |
Number of pages | 4 |
Volume | 1 |
ISBN (Electronic) | 9781510845510 |
Publication status | Published - 1 Jan 2016 |
Event | 23rd International Display Workshops in conjunction with Asia Display (IDW 2016) - Fukuoka, Japan Duration: 7 Dec 2016 → 9 Dec 2016 Conference number: 23 |
Conference
Conference | 23rd International Display Workshops in conjunction with Asia Display (IDW 2016) |
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Abbreviated title | IDW 2016 |
Country/Territory | Japan |
City | Fukuoka |
Period | 7/12/16 → 9/12/16 |
Keywords
- AMOLED display
- Mass production
- Metal oxide semiconductor
- Slot-die coating
- Solution processable