Ultrashort polarization converter on InP/InGaAsP fabricated by optical lithography

U. Khalique; Y.C. Zhu; J.J.G.M. Tol, van der; L.M. Augustin; R. Hanfoug; F.H. Groen; P.J. Veldhoven, van; M.K. Smit

Ultrashort polarization converter on InP/InGaAsP fabricated by optical lithography

U. Khalique, Y.C. Zhu, J.J.G.M. Tol, van der, L.M. Augustin, R. Hanfoug, F.H. Groen, P.J. Veldhoven, van, M.K. Smit

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

5 Citations (Scopus)

2 Downloads (Pure)

Abstract

A compact, ultra short, integrated polarization converter has been fabricated by optical lithography. Length of the converter is 125 µm, and 325 µm including tapers. Conversion efficiency is higher than 95% and loss is less than 1 dB.

Original language	English
Title of host publication	Proceedings of the Integrated Photonics Research and Applications: Nanophotonics for Information systems (IPRA 2005), 11-15 April 2005, San Diego, California, USA
Place of Publication	San Diego, CA
Pages	IWA3-1/3
Publication status	Published - 2005
Event	Integrated Photonics Research and Applications 2005 (IPR '05) / Nanophotonics for Information Systems, April 11-15, 2005, San Diego, CA, USA - San Diego, CA, United States Duration: 11 Apr 2005 → 15 Apr 2005

Conference

Conference	Integrated Photonics Research and Applications 2005 (IPR '05) / Nanophotonics for Information Systems, April 11-15, 2005, San Diego, CA, USA
Abbreviated title	IPR '05
Country	United States
City	San Diego, CA
Period	11/04/05 → 15/04/05

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Khalique, U., Zhu, Y. C., Tol, van der, J. J. G. M., Augustin, L. M., Hanfoug, R., Groen, F. H., Veldhoven, van, P. J., & Smit, M. K. (2005). Ultrashort polarization converter on InP/InGaAsP fabricated by optical lithography. In Proceedings of the Integrated Photonics Research and Applications: Nanophotonics for Information systems (IPRA 2005), 11-15 April 2005, San Diego, California, USA (pp. IWA3-1/3).

Khalique, U. ; Zhu, Y.C. ; Tol, van der, J.J.G.M. ; Augustin, L.M. ; Hanfoug, R. ; Groen, F.H. ; Veldhoven, van, P.J. ; Smit, M.K. / Ultrashort polarization converter on InP/InGaAsP fabricated by optical lithography. Proceedings of the Integrated Photonics Research and Applications: Nanophotonics for Information systems (IPRA 2005), 11-15 April 2005, San Diego, California, USA. San Diego, CA, 2005. pp. IWA3-1/3

@inproceedings{234c6c8f00c5442c87738964b3288c53,

title = "Ultrashort polarization converter on InP/InGaAsP fabricated by optical lithography",

abstract = "A compact, ultra short, integrated polarization converter has been fabricated by optical lithography. Length of the converter is 125 µm, and 325 µm including tapers. Conversion efficiency is higher than 95% and loss is less than 1 dB.",

author = "U. Khalique and Y.C. Zhu and {Tol, van der}, J.J.G.M. and L.M. Augustin and R. Hanfoug and F.H. Groen and {Veldhoven, van}, P.J. and M.K. Smit",

year = "2005",

language = "English",

pages = "IWA3--1/3",

booktitle = "Proceedings of the Integrated Photonics Research and Applications: Nanophotonics for Information systems (IPRA 2005), 11-15 April 2005, San Diego, California, USA",

note = "Integrated Photonics Research and Applications 2005 (IPR '05) / Nanophotonics for Information Systems, April 11-15, 2005, San Diego, CA, USA, IPR '05 ; Conference date: 11-04-2005 Through 15-04-2005",

}

Khalique, U, Zhu, YC, Tol, van der, JJGM, Augustin, LM, Hanfoug, R, Groen, FH, Veldhoven, van, PJ & Smit, MK 2005, Ultrashort polarization converter on InP/InGaAsP fabricated by optical lithography. in Proceedings of the Integrated Photonics Research and Applications: Nanophotonics for Information systems (IPRA 2005), 11-15 April 2005, San Diego, California, USA. San Diego, CA, pp. IWA3-1/3, Integrated Photonics Research and Applications 2005 (IPR '05) / Nanophotonics for Information Systems, April 11-15, 2005, San Diego, CA, USA, San Diego, CA, United States, 11/04/05.

Ultrashort polarization converter on InP/InGaAsP fabricated by optical lithography. / Khalique, U.; Zhu, Y.C.; Tol, van der, J.J.G.M.; Augustin, L.M.; Hanfoug, R.; Groen, F.H.; Veldhoven, van, P.J.; Smit, M.K.

Proceedings of the Integrated Photonics Research and Applications: Nanophotonics for Information systems (IPRA 2005), 11-15 April 2005, San Diego, California, USA. San Diego, CA, 2005. p. IWA3-1/3.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Ultrashort polarization converter on InP/InGaAsP fabricated by optical lithography

AU - Khalique, U.

AU - Zhu, Y.C.

AU - Tol, van der, J.J.G.M.

AU - Augustin, L.M.

AU - Hanfoug, R.

AU - Groen, F.H.

AU - Veldhoven, van, P.J.

AU - Smit, M.K.

PY - 2005

Y1 - 2005

N2 - A compact, ultra short, integrated polarization converter has been fabricated by optical lithography. Length of the converter is 125 µm, and 325 µm including tapers. Conversion efficiency is higher than 95% and loss is less than 1 dB.

AB - A compact, ultra short, integrated polarization converter has been fabricated by optical lithography. Length of the converter is 125 µm, and 325 µm including tapers. Conversion efficiency is higher than 95% and loss is less than 1 dB.

M3 - Conference contribution

SP - IWA3-1/3

BT - Proceedings of the Integrated Photonics Research and Applications: Nanophotonics for Information systems (IPRA 2005), 11-15 April 2005, San Diego, California, USA

CY - San Diego, CA

T2 - Integrated Photonics Research and Applications 2005 (IPR '05) / Nanophotonics for Information Systems, April 11-15, 2005, San Diego, CA, USA

Y2 - 11 April 2005 through 15 April 2005

ER -