Ultrahigh-density trench decoupling capacitors comprising multiple MIM layer stacks grown by atomic layer deposition

F. Roozeboom, W. Dekkers, K.B. Jinesh, J.H. Klootwijk, M.A. Verheijen, H.-D. Kim, D. Blin

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

2 Downloads (Pure)
Original languageEnglish
Title of host publicationProceedings of the 8th International Conference on Atomic Layer Deposition (ALD 2008), June 29 - July 2008, Bruges, Belgium (Book of Abstracts)
EditorsW.M.M. Kessels, A. Delabie
Place of PublicationS.n.
Publishers.n.
PagesMonA1-1-
Publication statusPublished - 2008

Cite this