Ultracold ion beams using laser cooling

E.J.D. Vredenbregt, S.H.W. Wouters, G. ten Haaf, P.H.A. Mutsaers

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

29 Downloads (Pure)

Abstract

Focused ion beam instruments a"re indispensable tools for the semiconductor industry due to their ability to image and modify structures on the nanometer length scale. For milling and deposition, the industry standard is the gallium liquid-metal ion source which enables a resorution of 5-10 nm at a current of a few pA. with the quest towards smaller features on integrated circuits, there is a need for novel ion sources that allow for better resolution. Several research groups are working towards applying laser-intensified alkali-metal ion beams for this purpose [1]. s-uch ultra-low temperature (1 mK) ion beams can be created by lasercooling and photo-ionization of a thermal atomic beam or vapor. The Rb ion source under development in Eindhoven in collaboration with FEI c
Original languageEnglish
Title of host publicationiCoRD Book of Abstracts
Subtitle of host publicationInternational conference on Rydbergs at Durham
Place of PublicationDurham
PublisherDurham University
Pages61
Number of pages1
Publication statusPublished - 2015
EventiCord_International Conference on Rydberg at Durham; 2015-07-03; 2015-07-03 - Durham, United Kingdom
Duration: 3 Jul 20153 Jul 2015

Conference

ConferenceiCord_International Conference on Rydberg at Durham; 2015-07-03; 2015-07-03
CountryUnited Kingdom
CityDurham
Period3/07/153/07/15
OtheriCord_International Conference on Rydberg at Durham

Fingerprint

Dive into the research topics of 'Ultracold ion beams using laser cooling'. Together they form a unique fingerprint.

Cite this