Abstract
We have employed plasma-enhanced and thermal atomic layer deposition (ALD) within the temperature range of 50–150°C for the deposition of ultra-thin (10–50 nm) Al2O3 films on 100Cr6 steel and aluminium Al2024-T3 alloys. [Al(CH3)3] was used as the precursor with either an O2 plasma or water as co-reactants. Neutral salt spray tests showed that the thicker films offered the best corrosion-resistance. Using cyclic voltametry, the 50 nm films were found to be the least porous (
Original language | English |
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Pages (from-to) | C132-C138 |
Number of pages | 7 |
Journal | Journal of the Electrochemical Society |
Volume | 158 |
Issue number | 5 |
DOIs | |
Publication status | Published - 2011 |