Ultra-sharp and highly tolerant waveguide bends for InP photonic membrane circuits

Y. Jiao, J. Liu, A.J. Millan Mejia, L. Shen, J.J.G.M. van der Tol

Research output: Contribution to journalArticleAcademicpeer-review

10 Citations (Scopus)
384 Downloads (Pure)

Abstract

In this paper we present a sharp bend design for the InP-based photonic membrane, which shows low loss and high tolerance. The traditional arc bends on InP membranes face high loss when the bending radii reduce below 2 µm. And their performance deteriorates even more dramatically at the presence of waveguide footings. The proposed design has advantages of low loss, high compactness, wide spectral response and ease of fabrication. It is also verified to be much more resilient to design and fabrication variations, such as waveguide footings. The sharp bend is fabricated together with traditional arc bends. Experimental results confirm its potential as a basic building block for InP photonic membrane platforms.
Original languageEnglish
Pages (from-to)1637-1640
JournalIEEE Photonics Technology Letters
Volume28
Issue number15
DOIs
Publication statusPublished - 10 May 2016

Fingerprint

Dive into the research topics of 'Ultra-sharp and highly tolerant waveguide bends for InP photonic membrane circuits'. Together they form a unique fingerprint.

Cite this