Ultra-low loss arrayed waveguide grating using deep UV lithography on a generic InP photonic integration platform

Jeroen Bolk, Huub Ambrosius, Prometheus Dasmahapatra, Patty Stabile, Sylwester Latkowski, Domenico D'Agostino, Elton Bitincka, Luc Augustin, DIdier Marsan, Rutger Voets, Kevin Williams

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

2 Citations (Scopus)

Abstract

ArF deep UV (193 nm) lithography was successfully applied to fabricate Arrayed Waveguide Gratings in generic Indium Phosphide technology. The sub-dB transmission losses demonstrate the advantages of scaling down the minimum feature size to 100 nm.

Original languageEnglish
Title of host publication43rd European Conference on Optical Communication, ECOC 2017
Place of PublicationPiscataway
PublisherInstitute of Electrical and Electronics Engineers
Pages1-3
Number of pages3
ISBN (Electronic)978-1-5386-5624-2
ISBN (Print)978-1-5386-4993-0
DOIs
Publication statusPublished - 24 Apr 2018
Event43rd European Conference on Optical Communications (ECOC 2017) - Gothenburg, Sweden
Duration: 17 Sep 201721 Sep 2017
Conference number: 43
http://ecoc2017.org/
http://ecoc2017.org

Conference

Conference43rd European Conference on Optical Communications (ECOC 2017)
Abbreviated titleECOC 2017
CountrySweden
CityGothenburg
Period17/09/1721/09/17
OtherThe largest conference on optical communication in Europe and
one of the largest and most prestigious events in this field worldwide.
Held in Gothenburg, Sweden 17-21 September 2017.
Internet address

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Cite this

Bolk, J., Ambrosius, H., Dasmahapatra, P., Stabile, P., Latkowski, S., D'Agostino, D., ... Williams, K. (2018). Ultra-low loss arrayed waveguide grating using deep UV lithography on a generic InP photonic integration platform. In 43rd European Conference on Optical Communication, ECOC 2017 (pp. 1-3). Piscataway: Institute of Electrical and Electronics Engineers. https://doi.org/10.1109/ECOC.2017.8345906