Abstract
ArF deep UV (193 nm) lithography was successfully applied to fabricate Arrayed Waveguide Gratings in generic Indium Phosphide technology. The sub-dB transmission losses demonstrate the advantages of scaling down the minimum feature size to 100 nm.
Original language | English |
---|---|
Title of host publication | 43rd European Conference on Optical Communication, ECOC 2017 |
Place of Publication | Piscataway |
Publisher | Institute of Electrical and Electronics Engineers |
Pages | 1-3 |
Number of pages | 3 |
ISBN (Electronic) | 978-1-5386-5624-2 |
ISBN (Print) | 978-1-5386-4993-0 |
DOIs | |
Publication status | Published - 24 Apr 2018 |
Event | 43rd European Conference on Optical Communications (ECOC 2017) - Gothenburg, Sweden Duration: 17 Sept 2017 → 21 Sept 2017 Conference number: 43 http://ecoc2017.org/ http://ecoc2017.org |
Conference
Conference | 43rd European Conference on Optical Communications (ECOC 2017) |
---|---|
Abbreviated title | ECOC 2017 |
Country/Territory | Sweden |
City | Gothenburg |
Period | 17/09/17 → 21/09/17 |
Other | The largest conference on optical communication in Europe and one of the largest and most prestigious events in this field worldwide. Held in Gothenburg, Sweden 17-21 September 2017. |
Internet address |
Funding
We would like to acknowledge NWO TTW (formerly known as STW) for partial funding of the research, InPACT for the fruitful collaboration and test substrates and ASML for technical advice and the continuous support of the installed lithography equipment.