Ultra-low loss arrayed waveguide grating using deep UV lithography on a generic InP photonic integration platform

Jeroen Bolk; Huub Ambrosius; Prometheus Dasmahapatra; Patty Stabile; Sylwester Latkowski; Domenico D'Agostino; Elton Bitincka; Luc Augustin; DIdier Marsan; Rutger Voets; Kevin Williams

doi:10.1109/ECOC.2017.8345906

Ultra-low loss arrayed waveguide grating using deep UV lithography on a generic InP photonic integration platform

Jeroen Bolk, Huub Ambrosius, Prometheus Dasmahapatra, Patty Stabile, Sylwester Latkowski, Domenico D'Agostino, Elton Bitincka, Luc Augustin, DIdier Marsan, Rutger Voets, Kevin Williams

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

2 Citations (Scopus)

2 Downloads (Pure)

Abstract

ArF deep UV (193 nm) lithography was successfully applied to fabricate Arrayed Waveguide Gratings in generic Indium Phosphide technology. The sub-dB transmission losses demonstrate the advantages of scaling down the minimum feature size to 100 nm.

Original language	English
Title of host publication	43rd European Conference on Optical Communication, ECOC 2017
Place of Publication	Piscataway
Publisher	Institute of Electrical and Electronics Engineers
Pages	1-3
Number of pages	3
ISBN (Electronic)	978-1-5386-5624-2
ISBN (Print)	978-1-5386-4993-0
DOIs	https://doi.org/10.1109/ECOC.2017.8345906
Publication status	Published - 24 Apr 2018
Event	43rd European Conference on Optical Communications (ECOC 2017) - Gothenburg, Sweden Duration: 17 Sept 2017 → 21 Sept 2017 Conference number: 43 http://ecoc2017.org/ http://ecoc2017.org

Conference

Conference	43rd European Conference on Optical Communications (ECOC 2017)
Abbreviated title	ECOC 2017
Country/Territory	Sweden
City	Gothenburg
Period	17/09/17 → 21/09/17
Other	The largest conference on optical communication in Europe and one of the largest and most prestigious events in this field worldwide. Held in Gothenburg, Sweden 17-21 September 2017.
Internet address	http://ecoc2017.org/ http://ecoc2017.org

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10.1109/ECOC.2017.8345906

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Bolk, J., Ambrosius, H., Dasmahapatra, P., Stabile, P., Latkowski, S., D'Agostino, D., Bitincka, E., Augustin, L., Marsan, DI., Voets, R., & Williams, K. (2018). Ultra-low loss arrayed waveguide grating using deep UV lithography on a generic InP photonic integration platform. In 43rd European Conference on Optical Communication, ECOC 2017 (pp. 1-3). Institute of Electrical and Electronics Engineers. https://doi.org/10.1109/ECOC.2017.8345906

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title = "Ultra-low loss arrayed waveguide grating using deep UV lithography on a generic InP photonic integration platform",

abstract = "ArF deep UV (193 nm) lithography was successfully applied to fabricate Arrayed Waveguide Gratings in generic Indium Phosphide technology. The sub-dB transmission losses demonstrate the advantages of scaling down the minimum feature size to 100 nm.",

author = "Jeroen Bolk and Huub Ambrosius and Prometheus Dasmahapatra and Patty Stabile and Sylwester Latkowski and Domenico D'Agostino and Elton Bitincka and Luc Augustin and DIdier Marsan and Rutger Voets and Kevin Williams",

year = "2018",

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day = "24",

doi = "10.1109/ECOC.2017.8345906",

language = "English",

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booktitle = "43rd European Conference on Optical Communication, ECOC 2017",

publisher = "Institute of Electrical and Electronics Engineers",

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note = "43rd European Conference on Optical Communications (ECOC 2017), ECOC 2017 ; Conference date: 17-09-2017 Through 21-09-2017",

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Bolk, J , Ambrosius, H, Dasmahapatra, P, Stabile, P , Latkowski, S, D'Agostino, D, Bitincka, E, Augustin, L, Marsan, DI, Voets, R & Williams, K 2018, Ultra-low loss arrayed waveguide grating using deep UV lithography on a generic InP photonic integration platform. in 43rd European Conference on Optical Communication, ECOC 2017. Institute of Electrical and Electronics Engineers, Piscataway, pp. 1-3, 43rd European Conference on Optical Communications (ECOC 2017), Gothenburg, Sweden, 17/09/17. https://doi.org/10.1109/ECOC.2017.8345906

Ultra-low loss arrayed waveguide grating using deep UV lithography on a generic InP photonic integration platform. / Bolk, Jeroen ; Ambrosius, Huub; Dasmahapatra, Prometheus et al.
43rd European Conference on Optical Communication, ECOC 2017. Piscataway: Institute of Electrical and Electronics Engineers, 2018. p. 1-3.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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T1 - Ultra-low loss arrayed waveguide grating using deep UV lithography on a generic InP photonic integration platform

AU - Bolk, Jeroen

AU - Ambrosius, Huub

AU - Dasmahapatra, Prometheus

AU - Stabile, Patty

AU - Latkowski, Sylwester

AU - D'Agostino, Domenico

AU - Bitincka, Elton

AU - Augustin, Luc

AU - Marsan, DIdier

AU - Voets, Rutger

AU - Williams, Kevin

N1 - Conference code: 43

PY - 2018/4/24

Y1 - 2018/4/24

N2 - ArF deep UV (193 nm) lithography was successfully applied to fabricate Arrayed Waveguide Gratings in generic Indium Phosphide technology. The sub-dB transmission losses demonstrate the advantages of scaling down the minimum feature size to 100 nm.

AB - ArF deep UV (193 nm) lithography was successfully applied to fabricate Arrayed Waveguide Gratings in generic Indium Phosphide technology. The sub-dB transmission losses demonstrate the advantages of scaling down the minimum feature size to 100 nm.

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BT - 43rd European Conference on Optical Communication, ECOC 2017

PB - Institute of Electrical and Electronics Engineers

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T2 - 43rd European Conference on Optical Communications (ECOC 2017)

Y2 - 17 September 2017 through 21 September 2017

ER -

Ultra-low loss arrayed waveguide grating using deep UV lithography on a generic InP photonic integration platform

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