ArF deep UV (193 nm) lithography was successfully applied to fabricate Arrayed Waveguide Gratings in generic Indium Phosphide technology. The sub-dB transmission losses demonstrate the advantages of scaling down the minimum feature size to 100 nm.
|Title of host publication||43rd European Conference on Optical Communication, ECOC 2017|
|Place of Publication||Piscataway|
|Publisher||Institute of Electrical and Electronics Engineers|
|Number of pages||3|
|Publication status||Published - 24 Apr 2018|
|Event||43rd European Conference on Optical Communications (ECOC 2017) - Gothenburg, Sweden|
Duration: 17 Sep 2017 → 21 Sep 2017
Conference number: 43
|Conference||43rd European Conference on Optical Communications (ECOC 2017)|
|Abbreviated title||ECOC 2017|
|Period||17/09/17 → 21/09/17|
|Other||The largest conference on optical communication in Europe and |
one of the largest and most prestigious events in this field worldwide.
Held in Gothenburg, Sweden 17-21 September 2017.