Ultra-low loss arrayed waveguide grating using deep UV lithography on a generic InP photonic integration platform

Jeroen Bolk; Huub Ambrosius; Prometheus Dasmahapatra; Patty Stabile; Sylwester Latkowski; Domenico D'Agostino; Elton Bitincka; Luc Augustin; DIdier Marsan; Rutger Voets; Kevin Williams

doi:10.1109/ECOC.2017.8345906

Ultra-low loss arrayed waveguide grating using deep UV lithography on a generic InP photonic integration platform

Jeroen Bolk, Huub Ambrosius, Prometheus Dasmahapatra, Patty Stabile, Sylwester Latkowski, Domenico D'Agostino, Elton Bitincka, Luc Augustin, DIdier Marsan, Rutger Voets, Kevin Williams

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

2 Citations (Scopus)

Abstract

ArF deep UV (193 nm) lithography was successfully applied to fabricate Arrayed Waveguide Gratings in generic Indium Phosphide technology. The sub-dB transmission losses demonstrate the advantages of scaling down the minimum feature size to 100 nm.

Original language	English
Title of host publication	43rd European Conference on Optical Communication, ECOC 2017
Place of Publication	Piscataway
Publisher	Institute of Electrical and Electronics Engineers
Pages	1-3
Number of pages	3
ISBN (Electronic)	978-1-5386-5624-2
ISBN (Print)	978-1-5386-4993-0
DOIs	https://doi.org/10.1109/ECOC.2017.8345906
Publication status	Published - 24 Apr 2018
Event	43rd European Conference on Optical Communications (ECOC 2017) - Gothenburg, Sweden Duration: 17 Sep 2017 → 21 Sep 2017 Conference number: 43 http://ecoc2017.org/ http://ecoc2017.org

Conference

Conference	43rd European Conference on Optical Communications (ECOC 2017)
Abbreviated title	ECOC 2017
Country	Sweden
City	Gothenburg
Period	17/09/17 → 21/09/17
Other	The largest conference on optical communication in Europe and one of the largest and most prestigious events in this field worldwide. Held in Gothenburg, Sweden 17-21 September 2017.
Internet address	http://ecoc2017.org/ http://ecoc2017.org

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Cite this

Bolk, J., Ambrosius, H., Dasmahapatra, P., Stabile, P., Latkowski, S., D'Agostino, D., ... Williams, K. (2018). Ultra-low loss arrayed waveguide grating using deep UV lithography on a generic InP photonic integration platform. In 43rd European Conference on Optical Communication, ECOC 2017 (pp. 1-3). Piscataway: Institute of Electrical and Electronics Engineers. https://doi.org/10.1109/ECOC.2017.8345906

Bolk, Jeroen ; Ambrosius, Huub ; Dasmahapatra, Prometheus ; Stabile, Patty ; Latkowski, Sylwester ; D'Agostino, Domenico ; Bitincka, Elton ; Augustin, Luc ; Marsan, DIdier ; Voets, Rutger ; Williams, Kevin. / Ultra-low loss arrayed waveguide grating using deep UV lithography on a generic InP photonic integration platform. 43rd European Conference on Optical Communication, ECOC 2017. Piscataway : Institute of Electrical and Electronics Engineers, 2018. pp. 1-3

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abstract = "ArF deep UV (193 nm) lithography was successfully applied to fabricate Arrayed Waveguide Gratings in generic Indium Phosphide technology. The sub-dB transmission losses demonstrate the advantages of scaling down the minimum feature size to 100 nm.",

author = "Jeroen Bolk and Huub Ambrosius and Prometheus Dasmahapatra and Patty Stabile and Sylwester Latkowski and Domenico D'Agostino and Elton Bitincka and Luc Augustin and DIdier Marsan and Rutger Voets and Kevin Williams",

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Bolk, J , Ambrosius, H, Dasmahapatra, P, Stabile, P , Latkowski, S, D'Agostino, D, Bitincka, E, Augustin, L, Marsan, DI, Voets, R & Williams, K 2018, Ultra-low loss arrayed waveguide grating using deep UV lithography on a generic InP photonic integration platform. in 43rd European Conference on Optical Communication, ECOC 2017. Institute of Electrical and Electronics Engineers, Piscataway, pp. 1-3, 43rd European Conference on Optical Communications (ECOC 2017), Gothenburg, Sweden, 17/09/17. https://doi.org/10.1109/ECOC.2017.8345906

Ultra-low loss arrayed waveguide grating using deep UV lithography on a generic InP photonic integration platform. / Bolk, Jeroen ; Ambrosius, Huub; Dasmahapatra, Prometheus; Stabile, Patty ; Latkowski, Sylwester; D'Agostino, Domenico; Bitincka, Elton; Augustin, Luc; Marsan, DIdier; Voets, Rutger; Williams, Kevin.

43rd European Conference on Optical Communication, ECOC 2017. Piscataway : Institute of Electrical and Electronics Engineers, 2018. p. 1-3.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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AU - Bolk, Jeroen

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AU - Dasmahapatra, Prometheus

AU - Stabile, Patty

AU - Latkowski, Sylwester

AU - D'Agostino, Domenico

AU - Bitincka, Elton

AU - Augustin, Luc

AU - Marsan, DIdier

AU - Voets, Rutger

AU - Williams, Kevin

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N2 - ArF deep UV (193 nm) lithography was successfully applied to fabricate Arrayed Waveguide Gratings in generic Indium Phosphide technology. The sub-dB transmission losses demonstrate the advantages of scaling down the minimum feature size to 100 nm.

AB - ArF deep UV (193 nm) lithography was successfully applied to fabricate Arrayed Waveguide Gratings in generic Indium Phosphide technology. The sub-dB transmission losses demonstrate the advantages of scaling down the minimum feature size to 100 nm.

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Bolk J , Ambrosius H, Dasmahapatra P, Stabile P , Latkowski S, D'Agostino D et al. Ultra-low loss arrayed waveguide grating using deep UV lithography on a generic InP photonic integration platform. In 43rd European Conference on Optical Communication, ECOC 2017. Piscataway: Institute of Electrical and Electronics Engineers. 2018. p. 1-3 https://doi.org/10.1109/ECOC.2017.8345906

Access to Document

10.1109/ECOC.2017.8345906

Link to publication in Scopus