Tuning the cloud point of methacrylic acid and oligoethyleneglycol methacrylate based random copolymers

C.R. Becer, R. Hoogenboom, S. Hahn, U.S. Schubert

Research output: Contribution to journalArticleAcademic

Abstract

Well-defined copolymers based on methacrylic acid and low-mol.-wt. polyethylene glycol methacrylate Me ether were prepd. via RAFT polymn. It was possible to tune the cloud point of the polymers simply by chaning the content of the two monomers in the copolymer. [on SciFinder (R)]
Original languageEnglish
Pages (from-to)1095-1096
JournalPolymer Preprints
Volume49
Issue number1
Publication statusPublished - 2008

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    Becer, C. R., Hoogenboom, R., Hahn, S., & Schubert, U. S. (2008). Tuning the cloud point of methacrylic acid and oligoethyleneglycol methacrylate based random copolymers. Polymer Preprints, 49(1), 1095-1096.