Well-defined copolymers based on methacrylic acid and low-mol.-wt. polyethylene glycol methacrylate Me ether were prepd. via RAFT polymn. It was possible to tune the cloud point of the polymers simply by chaning the content of the two monomers in the copolymer. [on SciFinder (R)]
|Publication status||Published - 2008|
Becer, C. R., Hoogenboom, R., Hahn, S., & Schubert, U. S. (2008). Tuning the cloud point of methacrylic acid and oligoethyleneglycol methacrylate based random copolymers. Polymer Preprints, 49(1), 1095-1096.