Tuning material properties of oxides and nitrides by substrate biasing during plasma-enhanced atomic layer deposition on planar and 3D substrate topographies

Tahsin Faraz, Harm C.M. Knoops, Marcel A. Verheijen, Cristian A.A. Van Helvoirt, Saurabh Karwal, Akhil Sharma, Vivek Beladiya, Adriana Szeghalmi, Dennis M. Hausmann, Jon Henri, Mariadriana Creatore, Wilhelmus M.M. Kessels

Research output: Contribution to journal › Article › Academic › peer-review

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