Treatment of dust particles in an RF plasma monitored by Mie scattering rotating compensator ellipsometry
- G.H.P.M. Swinkels
- , E. Stoffels
- , W.W. Stoffels
- , N. Simons
- , G.M.W. Kroesen
- , F.J. Hoog, de
Research output: Contribution to journal › Article › Academic › peer-review
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