Transport of atomic radicals in expanding plasmas : a laser spectroscopy study

S. Mazouffre, R.A.H. Engeln, M.G.H. Boogaarts, J.J.A.M. Mullen, van der, D.C. Schram

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Abstract

The transport mechanisms of radicals (H and D) and neutrals (Ar) in plasma expansions have been studied by means of laser-based diagnostic techniques: TALIF, LIF and UV Rayleigh scattering. The flow of radicals does not fulfill the well-established free-jet shock wave picture. H(D) atoms escape the supersonic domain of the plasma jet. This outward diffusion process is driven by the huge d. gradients induced in the background by wall-recombination. For the first time it is clearly shown that processes at surfaces can strongly influence the radical flow pattern. [on SciFinder (R)]
Original languageEnglish
Title of host publicationProgress in Plasma Processing of Materials 2001, Proceedings of the European Conference on Thermal Plasma Processes, 6th, Strasbourg, France, May 30-June 3, 2000
EditorsP. Fauchais
Place of PublicationNew York
PublisherBegell House Inc.
Pages83-88
ISBN (Print)1-567-00165-3
Publication statusPublished - 2001
Eventconference; TPP ; 6 : European Conference on Thermal Plasma Processes ; 6 (Strasbourg) : 2000.05.30-06.03 -
Duration: 1 Jan 2001 → …

Conference

Conferenceconference; TPP ; 6 : European Conference on Thermal Plasma Processes ; 6 (Strasbourg) : 2000.05.30-06.03
Period1/01/01 → …
OtherTPP ; 6 : European Conference on Thermal Plasma Processes ; 6 (Strasbourg) : 2000.05.30-06.03

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