ASML is the world's leading provider of complex lithography systems for the semiconductor industry. Such systems consist of numerous servo control systems to control, for instance, the positioning of a 15 kg wafer positioning module in six degrees of freedom with nanometer accuracy at acceleration speeds exceeding 14G. Servo applications are scheduled on multi-processor platforms to satisfy real-time latency and throughput requirements. However because of execution time variations or communication contention, deadlines cannot always be met. A challenge is therefore to produce robust schedules that are able to tolerate these timing variations. Working towards such robust multi-processor schedulers is the topic of this session. The following key items will be addressed: • trends and challenges in high-end servo control for lithography systems; • fast multi-processor/multi-core scheduling of servo applications; • computational performance analysis vs simulation-based performance analysis – Scenario Aware Dataflow.
|Title of host publication||Advanced School for Computing and Imaging (ASCI) Summer School, June 10, 2014, Soesterberg, The Netherlands|
|Publication status||Published - 2014|