TY - JOUR
T1 - TiO2 thin film patterns prepared by chemical vapor deposition and atomic layer deposition using an atmospheric pressure microplasma printer
AU - Aghaee, Morteza
AU - Verheijen, J.
AU - Stevens, A.A.E.
AU - Kessels, Erwin
AU - Creatore, Adriana
PY - 2019/12
Y1 - 2019/12
N2 - A microplasma printer is employed to deposit thin film patterns of TiO
2 by titanium tetra-isopropoxide and N
2/O
2 plasma at atmospheric pressure. The setup is adopted to carry out deposition in two configurations, namely under chemical vapor deposition (CVD) and atomic layer deposition (ALD) modes. The properties of TiO
2, as well as the patterning resolution, are investigated. The amorphous TiO
2 deposited in the CVD mode contains a relatively high level of impurities (residual carbon content of 5–10 at.%) and is characterized by a low refractive index of 1.8. With the ALD mode on the other hand, TiO
2 is obtained with a low level of impurities (<1 at.% C and <2 at.% N), a refractive index of 1.98, and a growth per cycle of 0.15 nm. Furthermore, the spatial resolution for a 8-nm-thick film is determined by X-ray photoelectron spectroscopy line scan and found to be equal to 2,000 and 900 µm for the CVD and ALD modes, respectively. This study can be regarded as the first step toward area-selective CVD and ALD of TiO
2 by a microplasma printer, which can be further explored and extended to other material systems.
AB - A microplasma printer is employed to deposit thin film patterns of TiO
2 by titanium tetra-isopropoxide and N
2/O
2 plasma at atmospheric pressure. The setup is adopted to carry out deposition in two configurations, namely under chemical vapor deposition (CVD) and atomic layer deposition (ALD) modes. The properties of TiO
2, as well as the patterning resolution, are investigated. The amorphous TiO
2 deposited in the CVD mode contains a relatively high level of impurities (residual carbon content of 5–10 at.%) and is characterized by a low refractive index of 1.8. With the ALD mode on the other hand, TiO
2 is obtained with a low level of impurities (<1 at.% C and <2 at.% N), a refractive index of 1.98, and a growth per cycle of 0.15 nm. Furthermore, the spatial resolution for a 8-nm-thick film is determined by X-ray photoelectron spectroscopy line scan and found to be equal to 2,000 and 900 µm for the CVD and ALD modes, respectively. This study can be regarded as the first step toward area-selective CVD and ALD of TiO
2 by a microplasma printer, which can be further explored and extended to other material systems.
KW - plasma printing
KW - plasma-assisted atomic layer deposition
KW - titanium dioxide
UR - http://www.scopus.com/inward/record.url?scp=85073953201&partnerID=8YFLogxK
U2 - 10.1002/ppap.201900127
DO - 10.1002/ppap.201900127
M3 - Article
SN - 1612-8850
VL - 16
JO - Plasma Processes and Polymers
JF - Plasma Processes and Polymers
IS - 12
M1 - 1900127
ER -