Time evolution of highly transient laser induced plasmas used for EUV Mask cleaning

N.A. Lammers; L. Scaccabarozzi; J.J.A.M. Mullen, van der

Time evolution of highly transient laser induced plasmas used for EUV Mask cleaning

N.A. Lammers, L. Scaccabarozzi, J.J.A.M. Mullen, van der

Elementary Processes in Gas Discharges

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

Abstract

Abstract only.

Original language	English
Title of host publication	Proceedings of the 22nd Symposium Plasma Physics & Radiation Technology, 9-10 March 2010, Lunteren, The Netherlands
Pages	A22-
Publication status	Published - 2010
Event	22nd NNV Symposium on Plasma Physics and Radiation Technology, March 9-10, 2010, Lunteren, The Netherlands - Lunteren, Netherlands Duration: 9 Mar 2010 → 10 Mar 2010

Conference

Conference	22nd NNV Symposium on Plasma Physics and Radiation Technology, March 9-10, 2010, Lunteren, The Netherlands
Country/Territory	Netherlands
City	Lunteren
Period	9/03/10 → 10/03/10
Other

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@inproceedings{58b47f99a43d4c079cf72624974c2a9a,

title = "Time evolution of highly transient laser induced plasmas used for EUV Mask cleaning",

abstract = "Abstract only.",

author = "N.A. Lammers and L. Scaccabarozzi and {Mullen, van der}, J.J.A.M.",

year = "2010",

language = "English",

pages = "A22--",

booktitle = "Proceedings of the 22nd Symposium Plasma Physics & Radiation Technology, 9-10 March 2010, Lunteren, The Netherlands",

note = "22nd NNV Symposium on Plasma Physics and Radiation Technology, March 9-10, 2010, Lunteren, The Netherlands ; Conference date: 09-03-2010 Through 10-03-2010",

}

Lammers, NA, Scaccabarozzi, L & Mullen, van der, JJAM 2010, Time evolution of highly transient laser induced plasmas used for EUV Mask cleaning. in Proceedings of the 22nd Symposium Plasma Physics & Radiation Technology, 9-10 March 2010, Lunteren, The Netherlands. pp. A22-, 22nd NNV Symposium on Plasma Physics and Radiation Technology, March 9-10, 2010, Lunteren, The Netherlands, Lunteren, Netherlands, 9/03/10.

Time evolution of highly transient laser induced plasmas used for EUV Mask cleaning. / Lammers, N.A.; Scaccabarozzi, L.; Mullen, van der, J.J.A.M.
Proceedings of the 22nd Symposium Plasma Physics & Radiation Technology, 9-10 March 2010, Lunteren, The Netherlands. 2010. p. A22-.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

TY - GEN

T1 - Time evolution of highly transient laser induced plasmas used for EUV Mask cleaning

AU - Lammers, N.A.

AU - Scaccabarozzi, L.

AU - Mullen, van der, J.J.A.M.

PY - 2010

Y1 - 2010

N2 - Abstract only.

AB - Abstract only.

M3 - Conference contribution

SP - A22-

BT - Proceedings of the 22nd Symposium Plasma Physics & Radiation Technology, 9-10 March 2010, Lunteren, The Netherlands

T2 - 22nd NNV Symposium on Plasma Physics and Radiation Technology, March 9-10, 2010, Lunteren, The Netherlands

Y2 - 9 March 2010 through 10 March 2010

ER -

Time evolution of highly transient laser induced plasmas used for EUV Mask cleaning

Abstract

Conference

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