In plasma processing commonly a distinction is made between low pressure (or
low (ion) temperature) plasmas and thermal plasmas1. The transition between these
two classes is gradual. Plasmas cover a wide spectrum in electron density(10 15/m3 — 10 23/m3) and ionization degree (10-7—1). In low pressure plasmas2 as RF—discharges the ionization degree is usually small and these plasmas are characterized by an abundance of molecular fragments and large ambipolar fields. The high electron density thermal plasmas have a high ionization degree and nearly full dissociation and a high heavy particle temperature. In this paper we will focuss on these plasmas.
|Title of host publication||Microwave Discharges: Fundamentals and Applications|
|Editors||C.M. Ferreira, M. Moisan|
|Place of Publication||London|
|Publication status||Published - 1993|
|Name||NATO ASI series. Series B: Physics|