Thermal discharges: experiments and diagnostics

D.C. Schram, D.A. Benoij, J.J. Beulens, F.H.A.G. Fey, M.J. Graaf, de, G.J. Meeusen, R.F.G. Meulenbroeks, J.J.A.M. Mullen, van der, J.M. Regt, de, M.C.M. Sanden, van de, Z. Qing

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In plasma processing commonly a distinction is made between low pressure (or low (ion) temperature) plasmas and thermal plasmas1. The transition between these two classes is gradual. Plasmas cover a wide spectrum in electron density(10 15/m3 — 10 23/m3) and ionization degree (10-7—1). In low pressure plasmas2 as RF—discharges the ionization degree is usually small and these plasmas are characterized by an abundance of molecular fragments and large ambipolar fields. The high electron density thermal plasmas have a high ionization degree and nearly full dissociation and a high heavy particle temperature. In this paper we will focuss on these plasmas.
Original languageEnglish
Title of host publicationMicrowave Discharges: Fundamentals and Applications
EditorsC.M. Ferreira, M. Moisan
Place of PublicationLondon
PublisherPlenum Press
ISBN (Print)0-306-44355-4
Publication statusPublished - 1993

Publication series

NameNATO ASI series. Series B: Physics
ISSN (Print)0258-1221


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