Thermal discharges: experiments and diagnostics

D.C. Schram; D.A. Benoij; J.J. Beulens; F.H.A.G. Fey; M.J. Graaf, de; G.J. Meeusen; R.F.G. Meulenbroeks; J.J.A.M. Mullen, van der; J.M. Regt, de; M.C.M. Sanden, van de; Z. Qing

Thermal discharges: experiments and diagnostics

D.C. Schram, D.A. Benoij, J.J. Beulens, F.H.A.G. Fey, M.J. Graaf, de, G.J. Meeusen, R.F.G. Meulenbroeks, J.J.A.M. Mullen, van der, J.M. Regt, de, M.C.M. Sanden, van de, Z. Qing

Plasma & Materials Processing

Research output: Chapter in Book/Report/Conference proceeding › Chapter › Academic › peer-review

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Abstract

In plasma processing commonly a distinction is made between low pressure (or low (ion) temperature) plasmas and thermal plasmas1. The transition between these two classes is gradual. Plasmas cover a wide spectrum in electron density(10 15/m3 — 10 23/m3) and ionization degree (10-7—1). In low pressure plasmas2 as RF—discharges the ionization degree is usually small and these plasmas are characterized by an abundance of molecular fragments and large ambipolar fields. The high electron density thermal plasmas have a high ionization degree and nearly full dissociation and a high heavy particle temperature. In this paper we will focuss on these plasmas.

Original language	English
Title of host publication	Microwave Discharges: Fundamentals and Applications
Editors	C.M. Ferreira, M. Moisan
Place of Publication	London
Publisher	Plenum Press
Pages	247-267
ISBN (Print)	0-306-44355-4
Publication status	Published - 1993

Publication series

Name	NATO ASI series. Series B: Physics
Volume	302
ISSN (Print)	0258-1221

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Schram, D. C., Benoij, D. A., Beulens, J. J., Fey, F. H. A. G., Graaf, de, M. J., Meeusen, G. J., Meulenbroeks, R. F. G., Mullen, van der, J. J. A. M., Regt, de, J. M., Sanden, van de, M. C. M., & Qing, Z. (1993). Thermal discharges: experiments and diagnostics. In C. M. Ferreira, & M. Moisan (Eds.), Microwave Discharges: Fundamentals and Applications (pp. 247-267). (NATO ASI series. Series B: Physics; Vol. 302). Plenum Press.

@inbook{8b07ba0b3cb647af93ed551a38077bf6,

title = "Thermal discharges: experiments and diagnostics",

abstract = "In plasma processing commonly a distinction is made between low pressure (or low (ion) temperature) plasmas and thermal plasmas1. The transition between these two classes is gradual. Plasmas cover a wide spectrum in electron density(10 15/m3 — 10 23/m3) and ionization degree (10-7—1). In low pressure plasmas2 as RF—discharges the ionization degree is usually small and these plasmas are characterized by an abundance of molecular fragments and large ambipolar fields. The high electron density thermal plasmas have a high ionization degree and nearly full dissociation and a high heavy particle temperature. In this paper we will focuss on these plasmas.",

author = "D.C. Schram and D.A. Benoij and J.J. Beulens and F.H.A.G. Fey and {Graaf, de}, M.J. and G.J. Meeusen and R.F.G. Meulenbroeks and {Mullen, van der}, J.J.A.M. and {Regt, de}, J.M. and {Sanden, van de}, M.C.M. and Z. Qing",

year = "1993",

language = "English",

isbn = "0-306-44355-4",

series = "NATO ASI series. Series B: Physics",

publisher = "Plenum Press",

pages = "247--267",

editor = "C.M. Ferreira and M. Moisan",

booktitle = "Microwave Discharges: Fundamentals and Applications",

address = "United States",

}

Schram, DC, Benoij, DA, Beulens, JJ, Fey, FHAG, Graaf, de, MJ, Meeusen, GJ, Meulenbroeks, RFG, Mullen, van der, JJAM, Regt, de, JM, Sanden, van de, MCM & Qing, Z 1993, Thermal discharges: experiments and diagnostics. in CM Ferreira & M Moisan (eds), Microwave Discharges: Fundamentals and Applications. NATO ASI series. Series B: Physics, vol. 302, Plenum Press, London, pp. 247-267.

Thermal discharges: experiments and diagnostics. / Schram, D.C.; Benoij, D.A.; Beulens, J.J. et al.

Microwave Discharges: Fundamentals and Applications. ed. / C.M. Ferreira; M. Moisan. London : Plenum Press, 1993. p. 247-267 (NATO ASI series. Series B: Physics; Vol. 302).

Research output: Chapter in Book/Report/Conference proceeding › Chapter › Academic › peer-review

TY - CHAP

T1 - Thermal discharges: experiments and diagnostics

AU - Schram, D.C.

AU - Benoij, D.A.

AU - Beulens, J.J.

AU - Fey, F.H.A.G.

AU - Graaf, de, M.J.

AU - Meeusen, G.J.

AU - Meulenbroeks, R.F.G.

AU - Mullen, van der, J.J.A.M.

AU - Regt, de, J.M.

AU - Sanden, van de, M.C.M.

AU - Qing, Z.

PY - 1993

Y1 - 1993

N2 - In plasma processing commonly a distinction is made between low pressure (or low (ion) temperature) plasmas and thermal plasmas1. The transition between these two classes is gradual. Plasmas cover a wide spectrum in electron density(10 15/m3 — 10 23/m3) and ionization degree (10-7—1). In low pressure plasmas2 as RF—discharges the ionization degree is usually small and these plasmas are characterized by an abundance of molecular fragments and large ambipolar fields. The high electron density thermal plasmas have a high ionization degree and nearly full dissociation and a high heavy particle temperature. In this paper we will focuss on these plasmas.

AB - In plasma processing commonly a distinction is made between low pressure (or low (ion) temperature) plasmas and thermal plasmas1. The transition between these two classes is gradual. Plasmas cover a wide spectrum in electron density(10 15/m3 — 10 23/m3) and ionization degree (10-7—1). In low pressure plasmas2 as RF—discharges the ionization degree is usually small and these plasmas are characterized by an abundance of molecular fragments and large ambipolar fields. The high electron density thermal plasmas have a high ionization degree and nearly full dissociation and a high heavy particle temperature. In this paper we will focuss on these plasmas.

M3 - Chapter

SN - 0-306-44355-4

T3 - NATO ASI series. Series B: Physics

SP - 247

EP - 267

BT - Microwave Discharges: Fundamentals and Applications

A2 - Ferreira, C.M.

A2 - Moisan, M.

PB - Plenum Press

CY - London

ER -

Thermal discharges: experiments and diagnostics

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