Thermal and plasma enhanced atomic layer deposition of Al2O3on GaAs substrates

S. Sioncke, A. Delabie, G. Brammertz, T. Conard, A. Franquet, M. Caymax, A.J. Urbanczyk, M.M. Heyns, M. Meuris, J.L. Hemmen, van, W. Keuning, W.M.M. Kessels

Research output: Contribution to journal › Article › Academic › peer-review

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Engineering & Materials Science

Chemical Compounds