Thermal and plasma enhanced atomic layer deposition of Al2O3on GaAs substrates

S. Sioncke, A. Delabie, G. Brammertz, T. Conard, A. Franquet, M. Caymax, A.J. Urbanczyk, M.M. Heyns, M. Meuris, J.L. Hemmen, van, W. Keuning, W.M.M. Kessels

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Engineering & Materials Science

Chemical Compounds