Thermal and plasma enhanced atomic layer deposition of AI2O3 on GaAs substrates

S. Sioncke; M. Caymax; T. Conard; A. Delabie; A. Franquet; M.M. Heyns; M. Meuris; A. Urbanczyk; J.L. Hemmen, van; W. Keuning; W.M.M. Kessels

Thermal and plasma enhanced atomic layer deposition of AI2O3 on GaAs substrates

S. Sioncke
, M. Caymax
, T. Conard
, A. Delabie
, A. Franquet
, M.M. Heyns
, M. Meuris
, A. Urbanczyk
, J.L. Hemmen, van
, W. Keuning
, W.M.M. Kessels

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Original language	English
Title of host publication	Proceedings of the 8th International Conference on Atomic Layer Deposition (ALD 2008), June 29 - July 2008, Bruges, Belgium (Book of Abstracts)
Editors	W.M.M. Kessels, A. Delabie
Place of Publication	S.n.
Publisher	s.n.
Pages	TueM1-2-
Publication status	Published - 2008

Cite this

Sioncke, S., Caymax, M., Conard, T., Delabie, A., Franquet, A., Heyns, M. M., Meuris, M., Urbanczyk, A., Hemmen, van, J. L., Keuning, W., & Kessels, W. M. M. (2008). Thermal and plasma enhanced atomic layer deposition of AI2O3 on GaAs substrates. In W. M. M. Kessels, & A. Delabie (Eds.), Proceedings of the 8th International Conference on Atomic Layer Deposition (ALD 2008), June 29 - July 2008, Bruges, Belgium (Book of Abstracts) (pp. TueM1-2-). s.n..

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title = "Thermal and plasma enhanced atomic layer deposition of AI2O3 on GaAs substrates",

author = "S. Sioncke and M. Caymax and T. Conard and A. Delabie and A. Franquet and M.M. Heyns and M. Meuris and A. Urbanczyk and \{Hemmen, van\}, J.L. and W. Keuning and W.M.M. Kessels",

year = "2008",

language = "English",

pages = "TueM1--2--",

editor = "W.M.M. Kessels and A. Delabie",

booktitle = "Proceedings of the 8th International Conference on Atomic Layer Deposition (ALD 2008), June 29 - July 2008, Bruges, Belgium (Book of Abstracts)",

publisher = "s.n.",

}

Sioncke, S, Caymax, M, Conard, T, Delabie, A, Franquet, A, Heyns, MM, Meuris, M, Urbanczyk, A, Hemmen, van, JL, Keuning, W & Kessels, WMM 2008, Thermal and plasma enhanced atomic layer deposition of AI2O3 on GaAs substrates. in WMM Kessels & A Delabie (eds), Proceedings of the 8th International Conference on Atomic Layer Deposition (ALD 2008), June 29 - July 2008, Bruges, Belgium (Book of Abstracts). s.n., S.n., pp. TueM1-2-.

Thermal and plasma enhanced atomic layer deposition of AI2O3 on GaAs substrates. / Sioncke, S.; Caymax, M.; Conard, T. et al.
Proceedings of the 8th International Conference on Atomic Layer Deposition (ALD 2008), June 29 - July 2008, Bruges, Belgium (Book of Abstracts). ed. / W.M.M. Kessels; A. Delabie. S.n.: s.n., 2008. p. TueM1-2-.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Thermal and plasma enhanced atomic layer deposition of AI2O3 on GaAs substrates

AU - Sioncke, S.

AU - Caymax, M.

AU - Conard, T.

AU - Delabie, A.

AU - Franquet, A.

AU - Heyns, M.M.

AU - Meuris, M.

AU - Urbanczyk, A.

AU - Hemmen, van, J.L.

AU - Keuning, W.

AU - Kessels, W.M.M.

PY - 2008

Y1 - 2008

M3 - Conference contribution

SP - TueM1-2-

BT - Proceedings of the 8th International Conference on Atomic Layer Deposition (ALD 2008), June 29 - July 2008, Bruges, Belgium (Book of Abstracts)

A2 - Kessels, W.M.M.

A2 - Delabie, A.

PB - s.n.

CY - S.n.

ER -