The texture in diffusion-grown layers of disilicides MeSi2 (Me = Mo, W, Ti, V, Nb, Ta) and compounds with related structures (NbGe2, TaGe2, TiGe2, TiNiCu)es MSi2 (M = Mo, W, Ti, V, Nb, Ta) and compounds with related structures (niobium-germanium ((NbGe2), tantalum-germanium (TaGe2), titanium-germanium (TiGe2), titanium-nickel-copper (TiNiCu))

In diffusion-grown layers with MoSi2 structure (MoSi2, WSi2, TiNiCu) and CrSi2 structure (NbSi2, VSi2, TaSi2, NbGe2, TaGe2) very sharp textures are observed, viz. a -fibre texture parallel to the direction of diffusion; only in WSi2 a [001]-fan texture is found. Phases with the TiSi2 structure (TISi2, TiGe2), however, do not show a texture. The occurrence of the "diffusion textures" is related to the crystal structures of these compounds. In several cases also so-called "recrystallization textures" occur which are related to the "diffusion textures" by a rotation of 10 to 45° around a Simple crystallographic direction perpendicular to the direction of diffusion.