The surface of tungsten/silicon compounds studied by low-energy ion scattering

G. C. Van Leerdam; P. A.J. Ackermans; P. A.C. Groenen; H. H. Brongersma; J. E.J. Schmitz

doi:10.1016/0168-583X(88)90319-9

The surface of tungsten/silicon compounds studied by low-energy ion scattering

G. C. Van Leerdam, P. A.J. Ackermans, P. A.C. Groenen, H. H. Brongersma, J. E.J. Schmitz

Applied Physics and Science Education

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Abstract

The surfaces of WSi_x and SiO₂ have been studied by LEIS. Analysis of the total shape of the spectra revealed that Si in WSi_x strongly segregates to the surface at 875 K, while W resides just below. The difference in locations of Si in the surfaces of WSi_x and SiC₂ explains the preferred reactivity of wf₆ to the WSi_x surface. As LEIS probes the surface in a similar way as molecules in chemical reactions do, this technique appears an ideal tool for investigating surface chemistry.

Original language	English
Pages (from-to)	500-503
Number of pages	4
Journal	Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms
Volume	35
Issue number	3-4
DOIs	https://doi.org/10.1016/0168-583X(88)90319-9
Publication status	Published - 2 Dec 1988

Bibliographical note

Funding Information:
We thank Mr. G.M. Wijers for the technical assistance in the recent modifications of the NODUS equipment. The investigations were supported in part by the Netherlands’ Foundation of Chemical Research (SON) with financial aid from the Netherlands’ Organization for the Advancement of Scientific Research (NWO).

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title = "The surface of tungsten/silicon compounds studied by low-energy ion scattering",

abstract = "The surfaces of WSix and SiO2 have been studied by LEIS. Analysis of the total shape of the spectra revealed that Si in WSix strongly segregates to the surface at 875 K, while W resides just below. The difference in locations of Si in the surfaces of WSix and SiC2 explains the preferred reactivity of wf6 to the WSix surface. As LEIS probes the surface in a similar way as molecules in chemical reactions do, this technique appears an ideal tool for investigating surface chemistry.",

author = "{Van Leerdam}, {G. C.} and Ackermans, {P. A.J.} and Groenen, {P. A.C.} and Brongersma, {H. H.} and Schmitz, {J. E.J.}",

note = "Funding Information: We thank Mr. G.M. Wijers for the technical assistance in the recent modifications of the NODUS equipment. The investigations were supported in part by the Netherlands{\textquoteright} Foundation of Chemical Research (SON) with financial aid from the Netherlands{\textquoteright} Organization for the Advancement of Scientific Research (NWO).",

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doi = "10.1016/0168-583X(88)90319-9",

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The surface of tungsten/silicon compounds studied by low-energy ion scattering. / Van Leerdam, G. C.; Ackermans, P. A.J.; Groenen, P. A.C. et al.
In: Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms, Vol. 35, No. 3-4, 02.12.1988, p. 500-503.

Research output: Contribution to journal › Article › Academic › peer-review

TY - JOUR

T1 - The surface of tungsten/silicon compounds studied by low-energy ion scattering

AU - Van Leerdam, G. C.

AU - Ackermans, P. A.J.

AU - Groenen, P. A.C.

AU - Brongersma, H. H.

AU - Schmitz, J. E.J.

N1 - Funding Information: We thank Mr. G.M. Wijers for the technical assistance in the recent modifications of the NODUS equipment. The investigations were supported in part by the Netherlands’ Foundation of Chemical Research (SON) with financial aid from the Netherlands’ Organization for the Advancement of Scientific Research (NWO).

PY - 1988/12/2

Y1 - 1988/12/2

N2 - The surfaces of WSix and SiO2 have been studied by LEIS. Analysis of the total shape of the spectra revealed that Si in WSix strongly segregates to the surface at 875 K, while W resides just below. The difference in locations of Si in the surfaces of WSix and SiC2 explains the preferred reactivity of wf6 to the WSix surface. As LEIS probes the surface in a similar way as molecules in chemical reactions do, this technique appears an ideal tool for investigating surface chemistry.

AB - The surfaces of WSix and SiO2 have been studied by LEIS. Analysis of the total shape of the spectra revealed that Si in WSix strongly segregates to the surface at 875 K, while W resides just below. The difference in locations of Si in the surfaces of WSix and SiC2 explains the preferred reactivity of wf6 to the WSix surface. As LEIS probes the surface in a similar way as molecules in chemical reactions do, this technique appears an ideal tool for investigating surface chemistry.

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DO - 10.1016/0168-583X(88)90319-9

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AN - SCOPUS:0024275733

SN - 0168-583X

VL - 35

SP - 500

EP - 503

JO - Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms

JF - Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms

IS - 3-4

ER -

The surface of tungsten/silicon compounds studied by low-energy ion scattering

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