The role of preamorphization and activation for ultra shallow junction formation on strained Si layers grown on SiGe buffer

B.J. Pawlak, W. Vandervorst, R. Lindsay, I. De Wolf, F. Roozeboom, R. Delhougne, A. Benedetti, R. Loo, M. Caymax, K. Maex, N.E.B. Cowern

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