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The role of ion-bulk interactions during high rate deposition of microcrystalline silicon by means of the multi-hole-cathode VHF plasma
A.H.M. Smets, M. Kondo
Plasma & Materials Processing
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Dive into the research topics of 'The role of ion-bulk interactions during high rate deposition of microcrystalline silicon by means of the multi-hole-cathode VHF plasma'. Together they form a unique fingerprint.
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Chemical Compounds
Microcrystalline silicon
Deposition rates
Cathodes
Plasmas
Ions
Silicon
Amorphization
Vacancies
Phase diagrams
Atoms
Substrates
Engineering & Materials Science
Microcrystalline silicon
Deposition rates
Cathodes
Ions
Plasmas
Amorphization
Silicon
Vacancies
Phase diagrams
Atoms
Substrates
Physics & Astronomy
cathodes
silicon
ions
interactions
very high frequencies
depletion
phase diagrams
atoms