The plasma charging of deposited particles

L.C.J. Heijmans, S. Nijdam

Research output: Contribution to conferencePosterAcademic

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Abstract

It is general knowledge that a substrate will charge to the floating potential when a plasma is applied over it. This potential is such, that there is a balance between the electron and ion flux towards it. Likewise any particle on said substrate will be charged. We show that this particle can gain a much higher surface charge density than the substrate due to its height. The charge is in the same order of magnitude as when the particle would be in the plasma bulk.
Original languageEnglish
Publication statusPublished - Jul 2016
Event23rd Europhysics Conference on Atomic and Molecular Physics on Ionized Gases ESCAMPIG XXIII, July 12-16, Bratislava, Slovakia - Bratislava, Slovakia
Duration: 12 Jul 201616 Jul 2016
https://www.escampig2016.org/

Conference

Conference23rd Europhysics Conference on Atomic and Molecular Physics on Ionized Gases ESCAMPIG XXIII, July 12-16, Bratislava, Slovakia
Abbreviated titleESCAMPIG2016
CountrySlovakia
CityBratislava
Period12/07/1616/07/16
Internet address

Bibliographical note

ESCAMPIG XXIII, Bratislava, Slovakia, July 12-16, 2016

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    Heijmans, L. C. J., & Nijdam, S. (2016). The plasma charging of deposited particles. Poster session presented at 23rd Europhysics Conference on Atomic and Molecular Physics on Ionized Gases ESCAMPIG XXIII, July 12-16, Bratislava, Slovakia, Bratislava, Slovakia.