The plasma charging of deposited particles

L.C.J. Heijmans; S. Nijdam

The plasma charging of deposited particles

L.C.J. Heijmans, S. Nijdam

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Abstract

It is general knowledge that a substrate will charge to the floating potential when a plasma is applied over it. This potential is such, that there is a balance between the electron and ion flux towards it. Likewise any particle on said substrate will be charged. We show that this particle can gain a much higher surface charge density than the substrate due to its height. The charge is in the same order of magnitude as when the particle would be in the plasma bulk.

Original language	English
Publication status	Published - Jul 2016
Event	23rd Europhysics Conference on Atomic and Molecular Physics on Ionized Gases ESCAMPIG XXIII, July 12-16, Bratislava, Slovakia - Bratislava, Slovakia Duration: 12 Jul 2016 → 16 Jul 2016 https://www.escampig2016.org/

Conference

Conference	23rd Europhysics Conference on Atomic and Molecular Physics on Ionized Gases ESCAMPIG XXIII, July 12-16, Bratislava, Slovakia
Abbreviated title	ESCAMPIG2016
Country/Territory	Slovakia
City	Bratislava
Period	12/07/16 → 16/07/16
Internet address	https://www.escampig2016.org/

Bibliographical note

ESCAMPIG XXIII, Bratislava, Slovakia, July 12-16, 2016

Cite this

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TY - CONF

T1 - The plasma charging of deposited particles

AU - Heijmans, L.C.J.

AU - Nijdam, S.

N1 - ESCAMPIG XXIII, Bratislava, Slovakia, July 12-16, 2016

PY - 2016/7

Y1 - 2016/7

N2 - It is general knowledge that a substrate will charge to the floating potential when a plasma is applied over it. This potential is such, that there is a balance between the electron and ion flux towards it. Likewise any particle on said substrate will be charged. We show that this particle can gain a much higher surface charge density than the substrate due to its height. The charge is in the same order of magnitude as when the particle would be in the plasma bulk.

AB - It is general knowledge that a substrate will charge to the floating potential when a plasma is applied over it. This potential is such, that there is a balance between the electron and ion flux towards it. Likewise any particle on said substrate will be charged. We show that this particle can gain a much higher surface charge density than the substrate due to its height. The charge is in the same order of magnitude as when the particle would be in the plasma bulk.

M3 - Poster

T2 - 23rd Europhysics Conference on Atomic and Molecular Physics on Ionized Gases ESCAMPIG XXIII, July 12-16, Bratislava, Slovakia

Y2 - 12 July 2016 through 16 July 2016

ER -

The plasma charging of deposited particles

Abstract

Conference

Bibliographical note

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Cite this