The optimum oxidation state of AlOx magnetic tunnel junctions

M. F. Gillies, W. Oepts, A. E. T. Kuiper, R. Coehoorn, Y. Tamminga, J.H.M. Snijders, W.M. Arnold Bik

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Abstract

The O-content of the Al layer in AlOx was determined by Rutherford Backscattering Spectrometry (RBS). The 35 s oxidation time gave enough O for the Al-oxide to be stoichiometric. Further, the bias dependence was obtained for 40 s oxidation time. These results indicate that a stoichiometric oxide is advantageous for obtaining a small bias dependence of the MR ratio.

Original languageEnglish
Title of host publication1999 IEEE International Magnetics Conference (INTERMAG)
Place of PublicationPiscataway
PublisherInstitute of Electrical and Electronics Engineers
Number of pages1
ISBN (Print)07803555555
DOIs
Publication statusPublished - 1 Dec 1999
Externally publishedYes
Event1999 IEEE International Magnetics Conference, Intermag 99 - Kyongju, South Korea
Duration: 18 May 199921 May 1999

Conference

Conference1999 IEEE International Magnetics Conference, Intermag 99
CityKyongju, South Korea
Period18/05/9921/05/99

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