@inbook{51b1e0d5380b438984837f3634ccf821,
title = "The influence of a Si-doped layer in an AlGaAs/GaAs heterostructure on the damage introduced by CH4/H2/Ar ECR plasma etching",
author = "\{Hassel, van\}, J.G. and \{Es, van\}, C.M. and P.A.M. Nouwens and J.H. Maahury and J.S. Wellen",
year = "1995",
language = "English",
booktitle = "Semiconductor and Integrated Optoelectronics Conference, SIOE '95",
note = "1995 Conference on Semiconductor and Integrated OptoElectronics (SIOE '95), March 1995, Cardiff, UK, SIOE '95 ; Conference date: 01-03-1995",
}